Pattern forming method, arranged fine particle pattern forming method, conductive pattern forming method, and conductive pattern material
First Claim
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1. A pattern forming method comprising:
- (a) bonding a compound to a substrate, the compound having both a polymerization initiating moiety capable of undergoing photocleavage to initiate radical polymerization and a substrate bonding moiety,(b) contacting a radical-polymerizable unsaturated hydrophilic polymer with the substrate wherein the radical-polymerizable unsaturated hydrophilic polymer is formed by reacting a functional group of a hydrophilic polymer with a monomer having an ethylene addition-polymerizable unsaturated group; and
(c) applying light to the substrate of step (b) patternwise to form a region where a graft polymer is generated and a region where a graft polymer is not generated.
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Abstract
The present invention provides a pattern forming method comprising bonding a compound to a substrate, the compound having both a polymerization initiating moiety capable of undergoing photocleavage to initiate radical polymerization and a substrate bonding moiety, contacting a radical-polymerizable unsaturated compound with the substrate, and exposing light thereto patternwise, so as to form a region where a graft polymer is generated and a region where a graft polymer is not generated. A conductive pattern forming method applying the pattern forming method, and a conductive pattern material obtained by the conductive film forming method.
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Citations
5 Claims
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1. A pattern forming method comprising:
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(a) bonding a compound to a substrate, the compound having both a polymerization initiating moiety capable of undergoing photocleavage to initiate radical polymerization and a substrate bonding moiety, (b) contacting a radical-polymerizable unsaturated hydrophilic polymer with the substrate wherein the radical-polymerizable unsaturated hydrophilic polymer is formed by reacting a functional group of a hydrophilic polymer with a monomer having an ethylene addition-polymerizable unsaturated group; and (c) applying light to the substrate of step (b) patternwise to form a region where a graft polymer is generated and a region where a graft polymer is not generated. - View Dependent Claims (2, 3, 4, 5)
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Specification