Large field of view 2X magnification projection optical system for FPD manufacture
First Claim
1. An exposure system for manufacturing flat panel displays (FPDS) comprising:
- a reticle stage adapted to hold a reticle;
a substrate stage adapted to hold a substrate;
a magnification reflective optical system that images the reticle onto the substrate, the reflective optical system comprising four powered mirrors; and
a reflective corrector near one of the reticle and the substrate, wherein the reflective corrector is configured to correct residual aberrations and telecentricity errors in the system to produce an image with a desired undistorted shape without forming an intermediate image.
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Abstract
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.
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Citations
51 Claims
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1. An exposure system for manufacturing flat panel displays (FPDS) comprising:
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a reticle stage adapted to hold a reticle; a substrate stage adapted to hold a substrate; a magnification reflective optical system that images the reticle onto the substrate, the reflective optical system comprising four powered mirrors; and a reflective corrector near one of the reticle and the substrate, wherein the reflective corrector is configured to correct residual aberrations and telecentricity errors in the system to produce an image with a desired undistorted shape without forming an intermediate image. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. An exposure system for manufacturing flat panel displays (FPDs) comprising:
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a reticle stage adapted to hold a reticle; a substrate stage adapted to hold a substrate; a magnification reflective optical system that images the reticle onto the substrate, the reflective optical system comprising at least two powered mirrors; and a reflective corrector near one of the reticle and the substrate, wherein the reflective corrector is configured to correct residual aberrations and telecentricity errors in the system to produce an image with a desired undistorted shape without forming an intermediate image. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
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40. An exposure system for manufacturing flat panel displays (FPDs) comprising:
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a reticle stage adapted to hold a reticle; a substrate stage adapted to hold a substrate; a magnification reflective optical system that images the reticle onto the substrate, the reflective optical system comprising a plurality of powered mirrors that are non-symmetric relative to their center axes; and a reflective corrector near one of the reticle and the substrate, wherein the reflective corrector is configured to correct residual aberrations and telecentricity errors in the system to produce an image with a desired undistorted shape without forming an intermediate image. - View Dependent Claims (41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51)
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Specification