Vaporizer
First Claim
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1. A semiconductor processing system comprising:
- a process chamber configured to accommodate a target substrate;
a support member configured to support the target substrate inside the process chamber;
a heater configured to heat the target substrate inside the process chamber;
an exhaust system configured to exhaust gas inside the process chamber;
a gas supply system configured to supply a process gas into the process chamber, and including a gas generating apparatus disposed outside the process chamber for generating the process gas from a liquid material,wherein the gas generating apparatus comprises;
a pre-treatment unit configured to generate a gas-liquid mixture fluid from the liquid material, anda vaporizer to which the fluid is supplied from the pre-treatment unit through a fluid supply passage,wherein the vaporizer comprises;
a container defining a process space of the vaporizer,a supply head connected to the fluid supply passage and having a plurality of spray holes to spray the fluid within the container,a heating passage disposed below the spray holes within the container and comprising a plurality of passage portions disposed in parallel with each other and respectively defined by heating walls, the heating passage being configured to heat the fluid passing therethrough downward and thereby generate the process gas,a gas delivery passage connected to the container to laterally deliver the process gas from below the heating passage,an electric heater configured to heat the process space and the heating walls; and
a mist receiver provided at the container below the gas delivery passage.
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Abstract
A vaporizer for generating a process gas from a gas-liquid mixture fluid includes a container defining a process space of the vaporizer. A supply head having a plurality of spray holes to spray the fluid is disposed within the container. A heating passage is disposed below the spray holes within the container. The heating passage is configured to heat the fluid passing therethrough and thereby generate the process gas. A gas delivery passage is connected to the container to laterally deliver the process gas from below the heating passage. A mist receiver is provided at the container below the gas delivery passage.
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Citations
20 Claims
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1. A semiconductor processing system comprising:
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a process chamber configured to accommodate a target substrate; a support member configured to support the target substrate inside the process chamber; a heater configured to heat the target substrate inside the process chamber; an exhaust system configured to exhaust gas inside the process chamber; a gas supply system configured to supply a process gas into the process chamber, and including a gas generating apparatus disposed outside the process chamber for generating the process gas from a liquid material, wherein the gas generating apparatus comprises; a pre-treatment unit configured to generate a gas-liquid mixture fluid from the liquid material, and a vaporizer to which the fluid is supplied from the pre-treatment unit through a fluid supply passage, wherein the vaporizer comprises; a container defining a process space of the vaporizer, a supply head connected to the fluid supply passage and having a plurality of spray holes to spray the fluid within the container, a heating passage disposed below the spray holes within the container and comprising a plurality of passage portions disposed in parallel with each other and respectively defined by heating walls, the heating passage being configured to heat the fluid passing therethrough downward and thereby generate the process gas, a gas delivery passage connected to the container to laterally deliver the process gas from below the heating passage, an electric heater configured to heat the process space and the heating walls; and a mist receiver provided at the container below the gas delivery passage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A semiconductor processing system comprising:
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a process chamber configured to accommodate a target substrate; a support member configured to support the target substrate inside the process chamber; a heater configured to heat the target substrate inside the process chamber; an exhaust system configured to exhaust gas inside the process chamber; a gas supply system configured to supply a process gas into the process chamber, and including a gas generating apparatus disposed outside the process chamber, for generating the process gas from a liquid material, wherein the gas generating apparatus comprises; a pretreatment unit configured to generate a gas-liquid mixture fluid from the liquid material such that the liquid material is supplied into a low-pressure space to vaporize part of the liquid material by adiabatic expansion and thereby generate the fluid, a storage vessel that stores the liquid material and is connected to the pre treatment unit through a liquid material supply passage, a gas supply unit configured to supply a pressurized gas to the storage vessel, so as to send the liquid material by pressure from the storage vessel to the pretreatment unit through the liquid material supply passage, a vaporizer to which the fluid is supplied from the pre-treatment unit through a fluid supply passage, and a gas supply unit configured to supply a carrier gas to the pre-treatment unit, wherein the fluid is supplied along with the carrier gas from the pre-treatment unit to the fluid vaporizer, wherein the vaporizer comprises; a container defining a process space of the vaporizer, a supply head connected to the fluid supply passage and having a plurality of spray holes to spray the fluid within the container, a heating passage disposed below the spray holes within the container and comprising a plurality of passage portions disposed in parallel with each other and respectively defined by heating walls, the heating passage being configured to heat the fluid passing therethrough downward and thereby generate the process gas, a gas delivery passage connected to the container to laterally deliver the process gas from below the heating passage, an electric heater configured to heat the process space and the heating walls; and a mist receiver provided at the container below the gas delivery passage. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification