Pattern generator using a dual phase step element and method of using same

• US 7,643,192 B2
• Filed: 11/24/2004
• Issued: 01/05/2010
• Est. Priority Date: 11/24/2004
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Baba-Ali, Nabila
• Primary Examiner(s): Cherry; Euncha P
• Application Number:
  US10/995,092
• Publication Number:
  US 20060109576A1
• Time in Patent Office: 1,868 Days
• Field of Search: 359223-226, 359290-291, 359/879, 359/855, 359/212.1, 359/862, 359/866
• US Class Current: 359/205.1
• CPC Class Codes: G02B 26/0833 the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD G02B26/0825 takes precedence; micromechanical devices in general B81B
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A system and method are used to pattern light using an illumination system, an array of individually controllable components, and a projection system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The array of individually controllable elements comprises mirrors having first and second steps on opposite edges. The projection system projects the patterned beam onto a target portion of an object. In various examples, the object can be a display, a semiconductor substrate or wafer, a flat panel display glass substrate, or the like, as is discussed in more detail below.

Claims

1. A system, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that patterns the beam, the array of individually controllable elements comprising mirrors including a first portion having a first size and a second portion having a second size, which is smaller than the first size, such that the first and second portions are arranged together to produce first and second steps on opposite edges of each of the mirrors; and

a projection system that projects the patterned beam onto a target portion of an object.

2. The system of claim 1, wherein a height and a width of the first and second steps of each respective one of the mirrors are sized to produce substantially equal positive and negative maximum amplitudes at the target portion over a complete range of tilt angles of the mirror.

3. The system of claim 1, wherein default positions of the mirrors are their ON states.

4. The system of claim 1, wherein default positions of the mirrors are their OFF states.

5. The system of claim 1, wherein a height and a width of the first and second steps of each respective one of the mirrors are sized so that the array of individually controllable elements emulates a binary reticle.

6. The system of claim 1, wherein a height and a width of the first and second steps of each respective one of the mirrors are sized so that the array of individually controllable elements emulates an attenuating phase shift reticle.

7. The system of claim 1, wherein a height and a width of the first and second steps of each respective one of the mirrors are sized so that the array of individually controllable elements emulates an alternating phase shift reticle.

8. The system of claim 1, wherein a height of the first and second steps on each respective one of the mirrors is approximately λ

/4, wherein λ

is a wavelength of the beam of radiation supplied by the illumination system.

9. The system of claim 1, wherein a width of the first and second steps on each respective one of the mirrors is approximately 5 nm to 12 nm.

10. The system of claim 1, wherein the object is a substrate.

11. The system of claim 1, wherein the object is a semiconductor substrate.

12. The system of claim 1, wherein the object is a flat panel display glass substrate.

13. The system of claim 1, wherein the object is a projection display.

14. The system of claim 1, wherein a width of the first and second steps on each respective one of the mirrors achieves equal maximum positive and negative amplitudes.

15. A method, comprising:

patterning a beam of radiation using an array of individually controllable elements, each element in the array including a first portion having a first size and a second portion having a second size, which is smaller than the first size, such that the first and second portions are arranged together to produce first and second steps on opposite edges of each of the mirrors; and

projecting the patterned beam onto a target portion of an object.

16. The method of claim 15, wherein the projecting step comprises using a substrate as the object.

17. The method of claim 15, wherein the projecting step comprises using a display device as the object.

18. The method of claim 15, wherein each element produces substantially equal positive and negative maximum amplitudes of reflected light over a complete range of tilt angles.

19. The method of claim 15, further comprising emulating a binary reticle using the array of individually controllable elements.

20. The method of claim 15, further comprising emulating an attenuating phase shift reticle using the array of individually controllable elements.

21. The method of claim 15, further comprising emulating an alternating phase shift reticle using the array of individually controllable elements.