Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process

• US 8,120,753 B2
• Filed: 11/08/2007
• Issued: 02/21/2012
• Est. Priority Date: 11/08/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Masktools B.V. (ASML Holding NV)
• Inventors: Berger, Gabriel, Coskun, Tamer, Park, Sangbong, Chen, Jang Fung
• Primary Examiner(s): Nguyen, Hung Henry
• Assistant Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US11/979,839
• Publication Number:
  US 20080204690A1
• Time in Patent Office: 1,566 Days
• Field of Search: 355/53, 355/67, 355/77, 430/5, 430/30, 703/2, 703/5, 716 19- 21, 716 50- 56
• US Class Current: 355/77
• CPC Class Codes: G03F 7/70216 Mask projection systems
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70675 Latent image, i.e. measuring the image of the exposed resist prior to development

Abstract

A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.

Claims

1. A method of generating a model for simulating an imaging performance of an optical imaging system having an illumination stage that illuminates a mask, and a pupil that projects the illumination from the mask to a substrate stage, said method comprising the steps of:

defining said optical imaging system and a process to be utilized by said optical imaging system;

identifying one or more existing model associated with said optical imaging system and said process;

defining a functional representation of said pupil;

modifying said functional representation of said pupil by calibrating with said one or more existing model to generate a calibrated pupil kernel, wherein said calibrated pupil kernel represents a model of the pupil performance;

defining a model equation including said calibrated pupil kernel, wherein said model equation represents said optical imaging system and said process; and

generating said simulation model using said model equation to simulate said imaging performance of said optical imaging system.

2. The method of generating a model for simulating the imaging performance of an optical imaging system having a pupil according to claim 1, wherein said calibrated pupil kernel is represented in said model equation utilizing a parametric representation.

3. The method of generating a model for simulating the imaging performance of an optical imaging system having a pupil according to claim 1, wherein said calibrated pupil kernel is represented in said model equation utilizing a pixel based representation.

4. The method of claim 3, wherein in the pixel-based representation, a transmittance value and a phase shift for each pixel are determined during calibration.

5. The method of claim 1, wherein the calibrated pupil kernel comprises a quasi-physical function utilized for improving resist calibration accuracy.

6. The method of claim 1, wherein the calibrated pupil kernel compensates for inaccuracies in one or more of mask representation, mask model, and pupil model.

7. The method of claim 1, wherein the calibrated pupil kernel is a spatial function of illumination angle.

8. The method of claim 1, wherein the functional representation of the pupil includes an empirical pupil filter that represented deviations of the pupil'"'"'s performance from a simple step function behavior.

9. The method of claim 1, wherein the functional representation of the pupil includes mask error correction factors that arc not considered in a mask model.

10. The method of claim 1, wherein the one or more existing model used for calibration includes a resist model.

11. The method of claim 1, wherein the model of the pupil performance represented by the calibrated pupil kernel comprises a linear model.

12. A method of simulating an imaging performance of an optical imaging system having an illumination stage that illuminates a mask, and a pupil that projects the illumination from the mask to a substrate stage, said method comprising the steps of:

defining said optical imaging system and a process to be utilized by said optical imaging system;

identifying one or more existing model associated with said optical imaging system and said process;

defining a functional representation of said pupil;

modifying said functional representation of said pupil by calibrating with said one or more existing model to generate a calibrated pupil kernel, wherein said calibrated pupil kernel represents a model of the pupil performance;

defining a model equation including said calibrated pupil kernel, wherein said model equation represents said optical imaging system and said process;

generating a simulation model using said model equation; and

processing a target pattern utilizing said simulation model so as to simulate said imaging performance of said optical imaging system.

13. The method of simulating the imaging performance of an optical imaging system having a pupil according to claim 12, wherein said calibrated pupil kernel is represented in said model equation utilizing a parametric representation.

14. The method of simulating the imaging performance of an optical imaging system having a pupil according to claim 12, wherein said calibrated pupil kernel is represented in said model equation utilizing a pixel based representation.

15. The method of claim 12, wherein the one or more existing model used for calibration includes a resist model.

16. The method of claim 12, wherein the model of the pupil performance represented by the calibrated pupil kernel comprises a linear model.

17. A non-transitory computer readable medium bearing a computer program for generating a model for simulating an imaging performance of an optical imaging system having an illumination stage that illuminates a mask, and a pupil that projects the illumination from the mask to a substrate stage, the computer program, when executed, causing a computer to perform the steps of:

defining said optical imaging system and a process to be utilized by said optical imaging system;

identifying one or more existing model associated with said optical imaging system and said process;

defining a functional representation of said pupil;

modifying said functional representation of said pupil by calibrating with said one or more existing model to generate a calibrated pupil kernel, wherein said calibrated pupil kernel represents a model of the pupil performance;

defining a model equation including a calibrated pupil kernel, wherein said model equation represents said optical imaging system and said process; and

generating said simulation model using said model equation to simulate said imaging performance of said optical imaging system.

18. The non-transitory computer readable medium according to claim 17, wherein said calibrated pupil kernel is represented in said model equation utilizing a parametric representation.

19. The non-transitory computer readable medium according to claim 17, wherein said calibrated pupil kernel is represented in said model equation utilizing a pixel based representation.

20. The method of claim 17, wherein the one or more existing model used for calibration includes a resist model.

21. The method of claim 17, wherein the model of the pupil performance represented by the calibrated pupil kernel comprises a linear model.