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Semiconductor device and method for manufacturing the same

  • US 8,395,148 B2
  • Filed: 11/04/2009
  • Issued: 03/12/2013
  • Est. Priority Date: 11/07/2008
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising:

  • a gate electrode layer;

    a gate insulating layer adjacent to the gate electrode layer; and

    a first oxide semiconductor layer adjacent to the gate insulating layer, the first oxide semiconductor layer comprising a channel formation region containing indium, gallium, and zinc,wherein the channel formation region contains at least one metal element selected from the group consisting of molybdenum, niobium, and tantalum.

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