Lithographic apparatus and device manufacturing method

• US 8,629,971 B2
• Filed: 04/23/2010
• Issued: 01/14/2014
• Est. Priority Date: 08/29/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Dierichs, Marcel Mathijs Theodore Marie, Donders, Sjoerd Nicolaas Lambertus, Jacobs, Johannes Henricus Wilhelmus, Jansen, Hans, Loopstra, Erik Roelof, Mertens, Jeroen Johannes Sophia Maria, Stavenga, Marco Koert, Streefkerk, Bob, Verhagen, Martinus Cornelis Maria, Seuntiens-Gruda, Lejla
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/766,609
• Publication Number:
  US 20100265476A1
• Time in Patent Office: 1,362 Days
• Field of Search: 355/53, 355/30, 355/55, 355/77, 355/72, 359/380, 359/886, 210/188, 210/321.6, 210/650, 210/640
• US Class Current: 355/30
• CPC Class Codes: B01D 19/0031 by filtration
• CPC Class Codes: B01D 61/025 Reverse osmosis; Hyperfiltration
• CPC Class Codes: B01D 61/24 Dialysis ; Membrane extraction
• CPC Class Codes: C02F 1/04 by distillation or evaporation
• CPC Class Codes: C02F 1/20 by degassing, i.e. liberation of dissolved gases degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D
• CPC Class Codes: C02F 1/28 by sorption using ion-exchange C02F1/42; sorbent compositions B01J
• CPC Class Codes: C02F 1/283 using coal, charred products, or inorganic mixtures containing them
• CPC Class Codes: C02F 1/32 with ultraviolet light
• CPC Class Codes: C02F 1/42 by ion-exchange ion-exchange in general B01J
• CPC Class Codes: C02F 1/441 by reverse osmosis
• CPC Class Codes: C02F 2103/40 from the manufacture or use of photosensitive materials
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Claims

1. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with an immersion liquid, the liquid supply system comprising an inlet to introduce the immersion liquid to the space and comprising;

a liquid purifier configured to purify the immersion liquid; and

a gas reduction system configured to separate gas from the immersion liquid before introduction into the space and to separate gas from fluid removed from the space, the gas reduction system configured to separate gas from the immersion liquid between the liquid purifier and the inlet.

2. The apparatus of claim 1, wherein the gas reduction system comprises a membrane to contact the immersion liquid to separate gas and liquid of the immersion liquid.

3. The apparatus of claim 1, further comprising a measurement device configured to measure oxygen content of the degassed liquid.

4. The apparatus of claim 1, wherein a gas/liquid separation element of the gas reduction system is upstream from and not in contact with the space.

5. The apparatus of claim 1, wherein a gas/liquid separation element of the gas reduction system is downstream from and not in contact with the space.

6. A lithographic projection apparatus, comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with a liquid, the liquid supply system comprising an inlet to introduce the immersion liquid to the space and comprising;

a liquid purifier configured to purify the liquid; and

a gas reduction system configured to reduce the oxygen content of the liquid to be supplied to the space and to separate gas from fluid removed from the space, the gas reduction system configured to reduce the oxygen content of the liquid between the liquid purifier and the inlet.

7. The apparatus of claim 6, wherein the liquid purifier is configured to purify the liquid such that it has a particle content of no more than 2 particles having a dimension of 50 nm or greater per ml of liquid.

8. The apparatus of claim 6, wherein the liquid purifier is configured to purify the liquid such that it has a particle content of no more than 0.5 particles having a dimension of 50 nm or greater per ml of liquid.

9. The apparatus of claim 6, further comprising a measurement device configured to measure the presence of particles in the liquid, the measurement device located downstream in a flow path of the liquid from the gas reduction system.

10. The apparatus of claim 9, wherein the measurement device comprises a particle counter.

11. The apparatus of claim 6, wherein the gas reduction system comprises a membrane configured to be in contact with the liquid to be supplied to the space or the fluid removed from the space, to separate gas from the liquid or fluid, the membrane not in contact with the space.

12. The apparatus of claim 6, wherein the liquid purifier comprises a distillation unit, or a de-hydrocarbonating unit configured to reduce the hydrocarbon content of the liquid, or a demineralizer, or any combination of the foregoing.

13. The apparatus of claim 6, constructed and arranged to irradiate the liquid with ultraviolet radiation prior to entry of the irradiated liquid into the space.

14. The apparatus of claim 6, configured to apply a life-form killing substance or radiation to the liquid and further comprising a filter configured to remove killed life-forms from the liquid.

15. The apparatus of claim 6, further comprising a measurement device configured to measure the oxygen content of the liquid.

16. A device manufacturing method, comprising:

purifying an immersion liquid;

separating gas from the purified immersion liquid;

at least partly filling a space between a projection system and a movable table with the degassed purified immersion liquid;

projecting a patterned radiation beam, through the immersion liquid, onto a target portion of a substrate; and

removing fluid from the space; and

separating gas or liquid from the removed fluid.

17. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate;

a structure comprising a plurality of pores;

a liquid handling system configured to at least partly fill a space between the projection system and the substrate table with an immersion liquid, the liquid handling system comprising an outlet passage from the space to remove fluid from the space and pass the fluid through the structure; and

a gas separation system, downstream from the structure and in the fluid path of the outlet passage, configured to separate gas or liquid from the fluid removed from the space via the outlet passage after having passed through the structure.

18. The apparatus of claim 17, wherein the gas separation system comprises a membrane to separate the gas or liquid from the fluid, the membrane downstream from and not in contact with the space.

19. A device manufacturing method, comprising:

at least partly filling a space between a projection system and a movable table with immersion liquid;

projecting a patterned radiation beam, through the immersion liquid, onto a target portion of a substrate; and

removing fluid from the space through an outlet passage and passing the fluid through a structure comprising a plurality of pores; and

separating gas or liquid from the removed-fluid removed via the outlet passage after having passed through the structure using a gas separation system downstream from the structure and in the fluid path of the outlet passage.

20. The method of claim 19, comprising separating gas or liquid from the removed fluid using a membrane, the membrane downstream from and not in contact with the space.