Nanoscale array structures suitable for surface enhanced raman scattering and methods related thereto
First Claim
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1. A method for fabricating a structure, the method comprising:
- providing a planar substrate;
coating the planar substrate with a polymer layer;
annealing the polymer layer, wherein the annealing causes a microphase separation of the polymer layer into first portions and second portions, the first portions being an array of nanostructures surrounded by the second portions, the second portions being a polymer matrix;
removing the array of nanostructures, whereby the removing forms an array of nanorecesses and the removing exposes portions of the planar substrate below the removed nanostructures; and
coating a first metal on the polymer matrix and the exposed portions of the planar substrate.
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Abstract
Methods for fabricating nanoscale array structures suitable for surface enhanced Raman scattering, structures thus obtained, and methods to characterize the nanoscale array structures suitable for surface enhanced Raman scattering. Nanoscale array structures may comprise nanotrees, nanorecesses and tapered nanopillars.
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Citations
18 Claims
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1. A method for fabricating a structure, the method comprising:
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providing a planar substrate; coating the planar substrate with a polymer layer; annealing the polymer layer, wherein the annealing causes a microphase separation of the polymer layer into first portions and second portions, the first portions being an array of nanostructures surrounded by the second portions, the second portions being a polymer matrix; removing the array of nanostructures, whereby the removing forms an array of nanorecesses and the removing exposes portions of the planar substrate below the removed nanostructures; and coating a first metal on the polymer matrix and the exposed portions of the planar substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method for fabricating a structure, the method comprising:
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providing a planar substrate; coating a photoresist layer on the planar substrate; exposing the photoresist layer with laser light, the laser light forming a spatial interference pattern on the photoresist layer; developing the photoresist layer to form an array of photoresist islands according to the spatial interference pattern; removing portions of the planar substrate not covered by the array of photoresist islands, wherein the removing forms an array of tapered nanopillars on the planar substrate; removing the array of photoresist islands; and coating a metal layer on the array of tapered nanopillars. - View Dependent Claims (15, 16, 17, 18)
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Specification