Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
First Claim
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1. An exposure apparatus comprising:
- a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and an object, the liquid supply system comprising an inlet to supply the liquid;
a member having;
an outlet, in a bottom surface of the member, configured to remove at least part of the liquid from the space,an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the object, the open aperture configured to allow the liquid to flow therethrough between above the open aperture and below the open aperture and the open aperture configured to allow the radiation beam to pass therethrough, anda surface extending around, and defining, a volume between the surface of the projection system and the open aperture; and
a movable table comprising a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object when in the recess, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening, the member located above the table and the table being movable with respect to the inlet.
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Abstract
An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.
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Citations
20 Claims
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1. An exposure apparatus comprising:
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a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate; a liquid supply system configured to provide a liquid to a space between the projection system and an object, the liquid supply system comprising an inlet to supply the liquid; a member having; an outlet, in a bottom surface of the member, configured to remove at least part of the liquid from the space, an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the object, the open aperture configured to allow the liquid to flow therethrough between above the open aperture and below the open aperture and the open aperture configured to allow the radiation beam to pass therethrough, and a surface extending around, and defining, a volume between the surface of the projection system and the open aperture; and a movable table comprising a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object when in the recess, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening, the member located above the table and the table being movable with respect to the inlet. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An exposure apparatus comprising:
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a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate; a liquid supply system configured to provide a liquid to a space between the projection system and the substrate; a movable table configured to support the substrate, wherein a gap is formed between the table and a lateral side of the substrate when the substrate is held on the table, the table having a fluid opening, facing toward the projection system on a surface of the table forming the bottom of the gap, to remove the liquid entering the gap; a liquid confinement structure configured to substantially confine the liquid to a localized area, on the substrate and/or on the table, having a size smaller than the area of a top surface of the substrate, the liquid confinement structure comprising; an outlet, in a bottom surface of the liquid confinement structure, configured to remove at least part of the liquid from the space, and an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the substrate, the aperture confiqured to allow the liquid to flow therethrouqh between above the aperture and below the aperture and the aperture configured to allow the radiation beam to pass therethrouqh; and a table motor system configured to displace the gap to be located under the localized area when the liquid is in the space and the radiation beam is projected through the space onto the substrate. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A device manufacturing method, comprising:
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projecting a beam of radiation, using a projection system, through a liquid and through an open aperture of a member, onto a radiation-sensitive target portion of a substrate; providing the liquid via an inlet to a space between the projection system and an object in a recess of a movable table, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object; removing at least part of the liquid from the space using an outlet in a bottom surface of the member, the member located above the table and the member having the open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the movable table and the member having a surface extending around, and defining, a volume between the surface of the projection system and the open aperture; allowing the liquid to flow through the open aperture between the volume and below the open aperture; and removing the liquid that enters the gap opening, using a fluid opening below the gap opening, the gap opening being movable with respect to the member. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification