Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap

• US 9,081,299 B2
• Filed: 08/01/2011
• Issued: 07/14/2015
• Est. Priority Date: 06/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Bijlaart, Erik Theodorus Maria, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Den Boef, Arie Jeffrey Maria, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Van De Kerkhof, Marcus Adrianus, Kolesnychenko, Aleksey Yurievich, Kroon, Mark, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ottens, Joost Jeroen, Straaijer, Alexander, Streefkerk, Bob, Van Santen, Helmar
• Primary Examiner(s): LIU, CHIA HOW MICHAEL
• Application Number:
  US13/195,248
• Publication Number:
  US 20110285977A1
• Time in Patent Office: 1,443 Days
• Field of Search: 355/72, 355/30, 355/53
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.

Claims

1. An exposure apparatus comprising:

a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and an object, the liquid supply system comprising an inlet to supply the liquid;

a member having;

an outlet, in a bottom surface of the member, configured to remove at least part of the liquid from the space,

an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the object, the open aperture configured to allow the liquid to flow therethrough between above the open aperture and below the open aperture and the open aperture configured to allow the radiation beam to pass therethrough, and

a surface extending around, and defining, a volume between the surface of the projection system and the open aperture; and

a movable table comprising a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object when in the recess, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening, the member located above the table and the table being movable with respect to the inlet.

2. The apparatus of claim 1, wherein the fluid opening is below a bottom surface of the object.

3. The apparatus of claim 1, wherein a top surface of the peripheral wall of the recess is substantially co-planar with a top surface of the object.

4. The apparatus of claim 1, wherein the table further comprises a movable member, below the gap opening, to fluidly connect or disconnect the fluid opening from the gap opening.

5. The apparatus of claim 1, wherein the object comprises the substrate.

6. The apparatus of claim 1, wherein the member is configured to substantially confine the liquid to a localized area, on a top surface of the table and/or the object, having a size smaller than the area of a top surface of the substrate.

7. The apparatus of claim 1, wherein an opening of the inlet to the space is located above the aperture and the aperture has a cross-sectional area smaller than the area of a top surface of the substrate.

8. An exposure apparatus comprising:

a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate;

a movable table configured to support the substrate, wherein a gap is formed between the table and a lateral side of the substrate when the substrate is held on the table, the table having a fluid opening, facing toward the projection system on a surface of the table forming the bottom of the gap, to remove the liquid entering the gap;

a liquid confinement structure configured to substantially confine the liquid to a localized area, on the substrate and/or on the table, having a size smaller than the area of a top surface of the substrate, the liquid confinement structure comprising;

an outlet, in a bottom surface of the liquid confinement structure, configured to remove at least part of the liquid from the space, and

an open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the substrate, the aperture confiqured to allow the liquid to flow therethrouqh between above the aperture and below the aperture and the aperture configured to allow the radiation beam to pass therethrouqh; and

a table motor system configured to displace the gap to be located under the localized area when the liquid is in the space and the radiation beam is projected through the space onto the substrate.

9. The apparatus of claim 8, wherein the fluid opening is below a plurality of projections of the table to support the substrate.

10. The apparatus of claim 8, wherein the table further comprises a movable member, below the gap, to fluidly connect or disconnect the fluid opening from the gap.

11. The apparatus of claim 8, further comprising a member, located on a top surface of the table, to provide a surface substantially co-planar with a top surface of the substrate, wherein the fluid opening is located under the member.

12. The apparatus of claim 8, wherein the table comprises a trench in the table and around the substrate, wherein the fluid opening is in the trench.

13. The apparatus of claim 8, wherein the table comprises a chamber and wherein the fluid opening is connected to the chamber and the chamber has a passage therefrom to a suction source.

14. The apparatus of claim 8, wherein the liquid confinement structure has a surface extending around, and defining, a volume between the surface of the projection system and the aperture.

15. A device manufacturing method, comprising:

projecting a beam of radiation, using a projection system, through a liquid and through an open aperture of a member, onto a radiation-sensitive target portion of a substrate;

providing the liquid via an inlet to a space between the projection system and an object in a recess of a movable table, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object;

removing at least part of the liquid from the space using an outlet in a bottom surface of the member, the member located above the table and the member having the open aperture in the bottom surface, the open aperture being below a surface of the projection system and above the movable table and the member having a surface extending around, and defining, a volume between the surface of the projection system and the open aperture;

allowing the liquid to flow through the open aperture between the volume and below the open aperture; and

removing the liquid that enters the gap opening, using a fluid opening below the gap opening, the gap opening being movable with respect to the member.

16. The method of claim 15, wherein the fluid opening is below a bottom surface of the object.

17. The method of claim 15, wherein a top surface of the peripheral wall of the recess is substantially co-planar with a top surface of the object.

18. The method of claim 15, further comprising fluidly connecting or disconnecting the fluid opening from the gap opening using a movable member, below the gap opening, of the table.

19. The method of claim 15, wherein the object comprises the substrate.

20. The method of claim 15, further comprising substantially confining the liquid to a localized area, on the object and/or the table, having a size smaller than the area of a top surface of the substrate.