Process window identifier
First Claim
1. A method of determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method comprising:
- obtaining a plurality of features in the area of interest;
obtaining a plurality of values of one or more processing parameters of the device manufacturing process;
determining, by a computer system, an existence of a defect, a probability of the existence of a defect, or both, in imaging each of the plurality of features by the device manufacturing process under each of the plurality of values;
determining, by the computer system, the OPW of the area of interest including the plurality of features from the existence of a defect, the probability of the existence of a defect, or both; and
producing electronic data using the OPW to configure an aspect of the device manufacturing process.
1 Assignment
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Accused Products
Abstract
Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method comprising: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.
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Citations
26 Claims
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1. A method of determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method comprising:
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obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining, by a computer system, an existence of a defect, a probability of the existence of a defect, or both, in imaging each of the plurality of features by the device manufacturing process under each of the plurality of values; determining, by the computer system, the OPW of the area of interest including the plurality of features from the existence of a defect, the probability of the existence of a defect, or both; and producing electronic data using the OPW to configure an aspect of the device manufacturing process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A non-transitory computer program product comprising a computer readable medium having instructions recorded thereon, the instructions when executed configured to cause a computer system to:
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obtain a plurality of features in an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate; obtain a plurality of values of one or more processing parameters of the device manufacturing process; determine an existence of a defect, a probability of the existence of a defect, or both, in imaging each of the plurality of features by the device manufacturing process under each of the plurality of values; determine overlapping process window (OPW) data of the area of interest including the plurality of features from the existence of a defect, the probability of the existence of a defect, or both; and produce electronic data using the OPW data to configure an aspect of the device manufacturing process. - View Dependent Claims (26)
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Specification