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Single-layer metalization and via-less metamaterial structures

  • US 9,887,465 B2
  • Filed: 07/01/2013
  • Issued: 02/06/2018
  • Est. Priority Date: 10/11/2007
  • Status: Active Grant
First Claim
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1. A metamaterial device, comprising:

  • a dielectric substrate having a first surface and a second, different surface;

    a first metallization layer formed on the first surface; and

    a second metallization layer formed on the second surface,wherein the first and second metallization layers are patterned to have two or more conductive parts including one or more cell patches on the first metallization layer to form a composite left and right handed (CRLH) metamaterial structure that comprises one or more unit cells, each of which is free of a conductive via structure traversing the dielectric substrate to connect the first metallization layer and the second metallization layer, and wherein the second metallization layer includes;

    a bottom ground electrode located outside a footprint of the one or more cell patches;

    a cell ground electrode located underneath a first cell patch amongst the one or more cell patches and electromagnetically coupled to the first cell patch without being connected to the first cell patch by a conductor that penetrates through the substrate, the cell ground electrode separated from the bottom ground electrode; and

    a conductive line that connects the cell ground electrode to the bottom ground electrode;

    wherein the dielectric substrate is shaped to conform to a curved or bent shape of another structure.

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