Manufacturing method of array substrate, array substrate and display apparatus
First Claim
1. A manufacturing method of an array substrate, comprising:
- providing a base substrate;
sequentially forming an active layer and a first insulating layer that covers the active layer on the base substrate;
performing one patterning process on the first insulating layer, so as to form a first through hole and a second through hole that expose the active layer in the first insulating layer, and form a first recess at a surface of the first insulating layer;
forming a conductive layer on the patterned first insulating layer, with the conductive layer being filled in the first through hole, the second through hole, and the first recess;
conducting a grinding process to remove the conductive layer on the surface of the first insulating layer and retain the conductive layer in the first through hole, the second through hole, and the first recess, whereby a source electrode, a drain electrode, and a pixel electrode are formed, respectively; and
forming a third recess at the surface of the first insulating layer, and retaining the conductive layer in the third recess to form a common electrode.
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Accused Products
Abstract
A manufacturing method of an array substrate, an array substrate and a display apparatus are provided. The manufacturing method includes: providing a base substrate; sequentially forming an active layer and a first insulating layer that covers the active layer on the base substrate; performing one patterning process on the first insulating layer, so as to form a first through hole and a second through hole that expose the active layer in the first insulating layer, and form a first recess at a surface of the first insulating layer; forming a conductive layer on the patterned first insulating layer, with the conductive layer being filled in the first through hole, the second through hole and the first recess; conducting a grinding process to form a source electrode, a drain electrode and a pixel electrode are formed respectively.
6 Citations
15 Claims
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1. A manufacturing method of an array substrate, comprising:
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providing a base substrate; sequentially forming an active layer and a first insulating layer that covers the active layer on the base substrate; performing one patterning process on the first insulating layer, so as to form a first through hole and a second through hole that expose the active layer in the first insulating layer, and form a first recess at a surface of the first insulating layer; forming a conductive layer on the patterned first insulating layer, with the conductive layer being filled in the first through hole, the second through hole, and the first recess; conducting a grinding process to remove the conductive layer on the surface of the first insulating layer and retain the conductive layer in the first through hole, the second through hole, and the first recess, whereby a source electrode, a drain electrode, and a pixel electrode are formed, respectively; and forming a third recess at the surface of the first insulating layer, and retaining the conductive layer in the third recess to form a common electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A manufacturing method of an array substrate, comprising:
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providing a base substrate; sequentially forming an active layer and a first insulating layer that covers the active layer on the base substrate; performing one patterning process on the first insulating layer, so as to form a first through hole and a second through hole that expose the active layer in the first insulating layer, and form a first recess at a surface of the first insulating layer; forming a conductive layer on the patterned first insulating layer, with the conductive layer being filled in the first through hole, the second through hole, and first recess; and conducting a grinding process to remove the conductive layer on the surface of the first insulting layer and retain the conductive layer in the first through hole, the second through hole, and the first recess, whereby a source electrode, a drain electrode, and a pixel electrode are formed, respectively; wherein the one pattering process comprises; coating a photoresist on the first insulating layer; conducting exposure on the photoresist with graytone mask or a halftone mask, then performing development of exposed photoresist so as to form a photoresist mask layer including a photoresist fully-retained region, a photoresist half-retained region, and a photoresist fully-removed region; forming a first blinding hole and a second blind hole with a first etching process; removing the photoresist in the photoresist half-retained region with an ashing process; forming the first recess as well as the first through hole and the second through hole that expose the active layer at locations of the first blind hole and the second blind hole with a second etching process, the first through hole being a stepped hole including a first portion and a second portion, the second through hole being a stepped hole including a third portion and a fourth portion; and removing the photoresist.
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11. An array substrate, comprising:
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a base substrate; an active layer on the base substrate and a first insulating layer covering the active layer, the first insulating layer having a first through hole and a second through hole that expose the active layer, and a first recess at a surface of the first insulating layer; a source electrode and a drain electrode that are located in the first through hole and the second through hole in the first insulating layer, respectively, and connected to the active layer, and a pixel electrode in the first recess; a third recess at the surface of the first insulating layer; and a common electrode in the third recess. - View Dependent Claims (12, 13, 14, 15)
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Specification