Manufacturing method of array substrate, array substrate and display apparatus

  • US 10,553,624 B2
  • Filed: 09/08/2017
  • Issued: 02/04/2020
  • Est. Priority Date: 02/20/2017
  • Status: Active Grant
First Claim
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1. A manufacturing method of an array substrate, comprising:

  • providing a base substrate;

    sequentially forming an active layer and a first insulating layer that covers the active layer on the base substrate;

    performing one patterning process on the first insulating layer, so as to form a first through hole and a second through hole that expose the active layer in the first insulating layer, and form a first recess at a surface of the first insulating layer;

    forming a conductive layer on the patterned first insulating layer, with the conductive layer being filled in the first through hole, the second through hole, and the first recess;

    conducting a grinding process to remove the conductive layer on the surface of the first insulating layer and retain the conductive layer in the first through hole, the second through hole, and the first recess, whereby a source electrode, a drain electrode, and a pixel electrode are formed, respectively; and

    forming a third recess at the surface of the first insulating layer, and retaining the conductive layer in the third recess to form a common electrode.

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