Dual-gate thin film transistor, manufacturing method thereof, array substrate and display device
First Claim
1. A dual-gate thin film transistor, comprising:
- a base substrate;
a first gate disposed on the base substrate;
a first gate insulating layer disposed on the first gate, the first gate insulating layer comprising a first via hole exposing a portion of the first gate;
an active layer disposed on the first gate insulating layer, the active layer and the first gate at least partially overlapping with each other in a direction perpendicular to the base substrate;
a second gate insulating layer disposed on the active layer;
a first electrode and a second electrode, which are disposed in contact with the active layer;
a second gate disposed on the second gate insulating layer, the second gate and the active layer at least partially overlapping with each other in a direction perpendicular to the base substrate, and the second gate, the first electrode and the second electrode formed in a same level;
a connection electrode electrically connected with the second gate and electrically connected with the first gate through the first via hole; and
a first passivation layer, wherein the first passivation layer is disposed on the second gate, the first passivation layer comprises a third via hole exposing the first via hole, and an area of an orthographic projection of the first via hole on the base substrate is larger than an area of an orthographic projection of the third via hole on the base substrate, and the orthographic projection of the third via hole on the base substrate is within the orthographic projection of the first via hole on the base substrate.
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Accused Products
Abstract
A dual-gate thin film transistor, a manufacturing method thereof, an array substrate and a display device are provided. The dual-gate thin film transistor includes: a base substrate and a first gate, a first gate insulating layer, an active layer, a second gate insulating layer, a first electrode, a second electrode, a second gate and a connection electrode, formed on the base substrate. The second gate, the first electrode and the second electrode are formed on the same level. The first gate insulating layer includes a first via hole exposing a portion of the first gate, and the connection electrode is electrically connected with the second gate and is electrically connected with the first gate through the first via hole.
7 Citations
20 Claims
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1. A dual-gate thin film transistor, comprising:
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a base substrate; a first gate disposed on the base substrate; a first gate insulating layer disposed on the first gate, the first gate insulating layer comprising a first via hole exposing a portion of the first gate; an active layer disposed on the first gate insulating layer, the active layer and the first gate at least partially overlapping with each other in a direction perpendicular to the base substrate; a second gate insulating layer disposed on the active layer; a first electrode and a second electrode, which are disposed in contact with the active layer; a second gate disposed on the second gate insulating layer, the second gate and the active layer at least partially overlapping with each other in a direction perpendicular to the base substrate, and the second gate, the first electrode and the second electrode formed in a same level; a connection electrode electrically connected with the second gate and electrically connected with the first gate through the first via hole; and a first passivation layer, wherein the first passivation layer is disposed on the second gate, the first passivation layer comprises a third via hole exposing the first via hole, and an area of an orthographic projection of the first via hole on the base substrate is larger than an area of an orthographic projection of the third via hole on the base substrate, and the orthographic projection of the third via hole on the base substrate is within the orthographic projection of the first via hole on the base substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 15, 20)
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12. A method for manufacturing a dual-gate thin film transistor, comprising:
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providing a base substrate; forming a first gate on the base substrate; forming a first gate insulating layer on the first gate; forming an active layer on the first gate insulating layer, the active layer partially overlapping the first gate in a direction perpendicular to the base substrate; forming a second gate insulating layer on the active layer; forming a second gate, a first electrode and a second electrode through one conductive layer, wherein the second gate is disposed on the second gate insulating layer and partially overlaps the active layer in a direction perpendicular to the base substrate, and both the first electrode and the second electrode are in contact with the active layer; and forming a connection electrode, which is electrically connected with the second gate and is electrically connected with the first gate; forming a first passivation layer; forming a first via hole exposing a portion of the first gate in the first gate insulating layer; and forming a third via hole exposing a portion of the first via hole in the first passivation layer, wherein an area of an orthographic projection of the first via hole on the base substrate is larger than an area of an orthographic projection of the third via hole on the base substrate, and the orthographic projection of the third via hole on the base substrate is within the orthographic projection of the first via hole on the base substrate. - View Dependent Claims (13, 14, 16, 17, 18, 19)
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Specification