Liquid crystal display device having single bodied compensating pattern and method of fabricating the same

• US 20030122978A1
• Filed: 11/15/2002
• Published: 07/03/2003
• Est. Priority Date: 12/29/2001
• Status: Abandoned Application

• Current Assignee: LG Display Co., Ltd.
• Original Assignee: LG Display Co., Ltd.
• Inventors: Lim, Joo Soo
• Application Number:
  US10/294,717
• Publication Number:
  US 20030122978A1
• Time in Patent Office: Days
• US Class Current: 349/42
• CPC Class Codes: G02F 1/1339 Gaskets; Spacers; Sealing of cells
• CPC Class Codes: G02F 1/1345 Conductors connecting electrodes to cell terminals

Abstract

A liquid crystal display device having a single bodied compensating pattern and a method of fabricating the same are disclosed in the present invention. The liquid crystal display device includes first and second substrates, a metal layer on the first substrate, a passivation layer over the first substrate, the passivation layer having a contact hole to expose a portion of the conductive pad, a sealant over the first substrate, a single bodied compensating pattern between the sealant and the metal layer, a conductive dot connecting the compensating pattern and a common electrode of the second substrate, and a liquid crystal layer between the first and second substrates.

Claims

1. A liquid crystal display device, comprising:

first and second substrates;

a metal layer on the first substrate;

a passivation layer over the first substrate, the passivation layer having a contact hole to expose a portion of the conductive pad;

a sealant over the first substrate;

a single bodied compensating pattern between the sealant and the metal layer;

a conductive dot connecting the compensating pattern and a common electrode of the second substrate; and

a liquid crystal layer between the first and second substrates.

2. The device of claim 1, further comprising a plurality of thin film transistors on the first substrate and a plurality of pixel electrodes connected to the thin film transistors.

3. The device of claim 2, wherein the compensating pattern is simultaneously formed with the pixel electrodes.

4. The device of claim 1, wherein the compensating pattern is formed on the passivation layer and in the contact hole.

5. The device of claim 1, wherein the passivation layer includes an organic insulating layer.

6. The device of claim 5, wherein the organic insulating layer includes one of BCB and photo-acrylate.

7. The device of claim 1, wherein the compensating pattern is formed of ITO.

8. The device of claim 1, wherein the metal layer includes one of a gate pad and a data pad.

9. The device of claim 1, wherein the conductive dot is formed of silver (Ag).

10. The device of claim 1, further comprising:

a black matrix on the second substrate;

a color filter layer on the black matrix; and

a common electrode on the color filter layer.

11. A method of forming a liquid crystal display device, comprising:

forming first and second substrates;

forming a metal layer on the first substrate;

forming a passivation layer over the first substrate, the passivation layer having a contact hole to expose a portion of the conductive pad;

forming a sealant over the first substrate;

forming a single bodied compensating pattern between the sealant and the metal layer;

forming a conductive dot connecting the compensating pattern and a common electrode of the second substrate; and

forming a liquid crystal layer between the first and second substrates.

12. The method of claim 11, further comprising a plurality of thin film transistors on the first substrate and a plurality of pixel electrodes connected to the thin film transistors.

13. The method of claim 12, wherein the compensating pattern is simultaneously formed with the pixel electrodes.

14. The method of claim 11, wherein the compensating pattern is formed on the passivation layer and in the contact hole.

15. The method of claim 11, wherein the passivation layer includes an organic insulating layer.

16. The method of claim 15, wherein the organic insulating layer includes one of BCB and photo-acrylate.

17. The method of claim 11, wherein the compensating pattern is formed of ITO.

18. The method of claim 11, wherein the metal layer includes one of a gate pad and a data pad.

19. The method of claim 11, wherein the conductive dot is formed of silver (Ag).

20. The method of claim 11, further comprising:

forming a black matrix on the second substrate;

forming a color filter layer on the black matrix; and

forming a common electrode on the color filter layer.