Method and system to reduce/detect a presence of gas in a flow of a cleaning fluid

• US 20030234929A1
• Filed: 06/24/2002
• Published: 12/25/2003
• Est. Priority Date: 06/24/2002
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Huang, Cheng Chieh, Yueh, Liang Kun, Liu, Jun Xiu
• Application Number:
  US10/179,663
• Publication Number:
  US 20030234929A1
• Time in Patent Office: Days
• US Class Current: 356/338
• CPC Class Codes: G01N 21/534 by measuring transmission alone, i.e. determining opacity
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

Provided are a method and an apparatus to reduce/detect a presence of a gas in fluids employed in semiconductor manufacturing processes. One embodiment of the invention includes creating a flow of cleaning fluids and impinging electromagnetic radiation upon a region of the flow. The electromagnetic radiation is sensitive to phase state changes in the flow, i.e., changes between liquid and gas, so that air bubbles in the liquid flow may be detected. The electromagnetic radiation is sensed and a signal is produced in response to phase state changes in the flow. The flow of the cleaning fluid is terminated in response to the signal. In accordance with another embodiment a system is provided that operates in accordance with the method.

Claims

1. A method to reduce a presence of gas in a flow of a cleaning fluid introduced into a semiconductor process chamber, said method comprising:

creating said flow of said cleaning fluid;

impinging electromagnetic radiation upon a region of said flow, with said electromagnetic radiation being sensitive to phase state changes in said flow;

sensing said electromagnetic radiation and producing a signal in response phase state changes in said flow; and

terminating said flow of said cleaning fluid in response to said signal.

2. The method as recited in claim 1 wherein terminating said flow further includes terminating said flow of said cleaning fluid in response to said signal having a predetermined magnitude.

3. The method as recited in claim 1 wherein terminating said flow further includes terminating said flow of said cleaning fluid in response to said signal including a plurality of peaks having a predetermined magnitude.

4. The method as recited in claim 1 wherein terminating said flow further includes terminating said flow of said cleaning fluid in response to said signal having a plurality of peaks within a predetermined period of time.

5. The method as recited in claim 1 further including forming vaporized fluid by vaporizing said cleaning fluid after sensing said electromagnetic radiation, and creating a flow of said vaporized fluid into said semiconductor processing chamber.

6. The method as recited in claim 1 wherein impinging said electromagnetic radiation further includes reflecting said electromagnetic radiation from said region.

7. The method as recited in claim 1 wherein impinging said electromagnetic radiation further includes propagating said electromagnetic radiation through a cross-section of said flow.

8. The method as recited in claim 1 further including disposing a substrate within said semiconductor processing chamber and forming said vaporized fluid by vaporizing said cleaning fluid after sensing said electromagnetic radiation, and cleaning residue from said substrate.

9. The method as recited in claim 1 wherein terminating said flow further includes creating a perceivable stimuli in response to said signal, with said perceivable stimuli selected from a set of stimuli consisting of vibration, light and sound.

10. A method to detect a presence of gas in a flow of a cleaning fluid introduced into a semiconductor process chamber, said method comprising:

disposing a substrate within said processing chamber;

creating said flow of said cleaning fluid;

impinging electromagnetic radiation upon a region of said flow, with said electromagnetic radiation being sensitive to phase state changes in said flow;

sensing said electromagnetic radiation and producing a signal in response phase state changes in said flow; and

creating a flow of vaporized fluid into said processing chamber to remove residue from said substrate by vaporizing said cleaning fluid after sensing said electromagnetic radiation; and

terminating said flow of vaporized fluid into said processing chamber in response to said signal.

11. The method as recited in claim 10 wherein terminating said flow further includes terminating said flow of said cleaning fluid in response to said signal having a predetermined magnitude.

12. The method as recited in claim 10 wherein terminating said flow further includes terminating said flow of said cleaning fluid in response to said signal including a plurality of peaks having a predetermined magnitude.

13. The method as recited in claim 10 wherein terminating said flow further includes terminating said flow of said cleaning fluid in response to said signal having a predetermined number of peaks within a predetermined period of time.

14. The method as recited in claim 10 wherein terminating said flow further includes creating a perceivable stimuli in response to said signal, with said perceivable stimuli selected from a set of stimuli consisting of vibration, light and sound.

15. An etching system including:

an etch chamber;

a vaporizer in fluid communication with said etch chamber;

a supply of a cleaning liquid;

a conduit placing said supply in fluid communication with said vaporizer, with said supply adapted to direct a flow of said cleaning liquid through said conduit;

a transmitter to direct electromagnetic radiation into a region of said conduit, with said electromagnetic radiation being sensitive to phase state changes in said region; and

a receiver to sense said electromagnetic radiation after impinging upon said region to produce a signal in response to said electromagnetic radiation, with said signal including information concerning said phase state changes.

16. The system as recited in claim 15 wherein said receiver is disposed opposite to said transmitter to sense radiation propagating through said region.

17. The system as recited in claim 15 wherein said receiver is disposed to sense radiation reflecting from said region.

18. The system as recited in claim 15 further including a processor in electrical communication with both a detector and said supply, and a memory in electrical communication with said processor, said memory comprising a computer-readable medium having a computer-readable program embodied therein, said computer-readable program including a set of instructions to cause said processor to operate on said supply and terminate said flow of said cleaning fluid upon sensing said signal.

19. The system as recited in claim 18 wherein said set of instructions further includes a subroutine to cause said processor to operate on said supply to terminate said flow of said cleaning fluid in response to said signal having a predetermined magnitude.

20. The system as recited in claim 18 wherein said set of instructions further includes a subroutine to cause said processor to operate on said supply to terminate said flow of said cleaning fluid in response to said signal having a plurality of peaks having a predetermined magnitude.

21. The system as recited in claim 18 wherein said set of instructions further includes a subroutine to cause said processor to operate on said supply to terminate said flow of said cleaning fluid in response to said signal having a plurality of peaks within a predetermined period of time.