Wafer cleaning
First Claim
1. A method of processing a thin, flat substrate, comprising:
- supporting the substrate in a generally horizontal orientation; and
transmitting sonic energy to the substrate while flowing liquid onto both sides of the substrate to loosen particles on both sides of the substrate while maintaining said orientation.
21 Assignments
0 Petitions
Accused Products
Abstract
Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe. In one arrangement, fluid is sprayed onto both sides of a wafer while a probe is positioned close to an upper side. In another arrangement, a short probe is positioned with its end face close to the surface of a wafer, and the probe is moved over the wafer as it rotates. The probe may also be positioned through a central hole in a plurality of discs to clean a group of such elements at one time.
107 Citations
11 Claims
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1. A method of processing a thin, flat substrate, comprising:
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supporting the substrate in a generally horizontal orientation; and
transmitting sonic energy to the substrate while flowing liquid onto both sides of the substrate to loosen particles on both sides of the substrate while maintaining said orientation. - View Dependent Claims (2, 3, 4)
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5. A method of cleaning thin articles having two generally planar opposite sides, said method comprising:
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applying cleaning fluid to one of said sides while supporting said article in a generally horizontal orientation; and
applying energy to the other one of said sides with sufficient power to produce vibration on said one side in the area of said cleaning fluid to loosen particles on said one side, while maintaining said orientation. - View Dependent Claims (6, 7, 8, 9, 10, 11)
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Specification