×

Endpoint detector for a substrate manufacturing process

  • US 20050127192A1
  • Filed: 12/14/2004
  • Published: 06/16/2005
  • Est. Priority Date: 12/15/2003
  • Status: Abandoned Application
First Claim
Patent Images

1. An apparatus for detecting an endpoint in a substrate processing, comprising:

  • a window covering a passage formed through a sidewall of a processing chamber in which the substrate processing is performed, the window transmitting light generated from plasma during the substrate processing;

    an analyzing unit for analyzing the light to detect an endpoint of the substrate processing;

    a first temperature control unit, thermally coupled to the window, for maintaining the window at a first temperature; and

    a second temperature control unit, thermally coupled to an inner surface of the passage, for maintaining the inner surface of the passage at a second temperature, the second temperature being lower than the first temperature.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×