Very large scale immobilized polymer synthesis

• US 20050214828A1
• Filed: 01/21/2005
• Published: 09/29/2005
• Est. Priority Date: 06/07/1989
• Status: Abandoned Application

• Current Assignee: Affymetrix, Inc. (Thermo Fisher Scientific Incorporated)
• Original Assignee: Affymetrix, Inc. (Thermo Fisher Scientific Incorporated)
• Inventors: Fodor, Stephen P.A., Pirrung, Michael C., Stryer, Lubert, Read, J. Leighton
• Application Number:
  US11/040,520
• Publication Number:
  US 20050214828A1
• Time in Patent Office: Days
• US Class Current: 435/6
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00315 Microtiter plates
• CPC Class Codes: B01J 2219/00432 Photolithographic masks
• CPC Class Codes: B01J 2219/00434 Liquid crystal masks
• CPC Class Codes: B01J 2219/00436 Maskless processes
• CPC Class Codes: B01J 2219/00459 Beads
• CPC Class Codes: B01J 2219/00468 by manipulation of individual beads
• CPC Class Codes: B01J 2219/00475 Sheets
• CPC Class Codes: B01J 2219/005 Beads
• CPC Class Codes: B01J 2219/00527 Sheets
• CPC Class Codes: B01J 2219/00529 DNA chips
• CPC Class Codes: B01J 2219/00531 essentially square
• CPC Class Codes: B01J 2219/00585 Parallel processes
• CPC Class Codes: B01J 2219/0059 Sequential processes
• CPC Class Codes: B01J 2219/00596 Solid-phase processes
• CPC Class Codes: B01J 2219/00605 the compounds being directly bound or immobilised to solid supports
• CPC Class Codes: B01J 2219/00608 DNA chips
• CPC Class Codes: B01J 2219/0061 The surface being organic
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00617 by chemical means
• CPC Class Codes: B01J 2219/00619 : using hydrophilic or hydrophobic regions
• CPC Class Codes: B01J 2219/00621 : by physical means, e.g. trenches, raised areas
• CPC Class Codes: B01J 2219/00626 : Covalent
• CPC Class Codes: B01J 2219/00637 : by coating it with another layer
• CPC Class Codes: B01J 2219/00639 : the compounds being trapped in or bound to a porous medium
• CPC Class Codes: B01J 2219/00648 : by the use of solid beads
• CPC Class Codes: B01J 2219/00659 : Two-dimensional arrays
• CPC Class Codes: B01J 2219/00689 : using computers
• CPC Class Codes: B01J 2219/00695 : Synthesis control routines, e.g. using computer programs
• CPC Class Codes: B01J 2219/00711 : Light-directed synthesis
• CPC Class Codes: B01J 2219/00722 : Nucleotides
• CPC Class Codes: B01J 2219/00725 : Peptides
• CPC Class Codes: B01L 7/52 : with provision for submitting samples to a predetermined sequence of different temperatures, e.g. for treating nucleic acid samples amplification or hybridisation processes per se C12Q1/68; controlling sequential reactions for synthesis B01J19/0046
• CPC Class Codes: B82Y 10/00 : Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 30/00 : Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C07B 2200/11 : Compounds covalently bound to a solid support
• CPC Class Codes: C07C 229/14 : to carbon atoms of carbon skeletons containing rings
• CPC Class Codes: C07C 229/16 : to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
• CPC Class Codes: C07D 263/44 : Two oxygen atoms
• CPC Class Codes: C07D 317/62 : with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to atoms of the carbocyclic ring
• CPC Class Codes: C07H 19/04 : Heterocyclic radicals containing only nitrogen atoms as ring hetero atom
• CPC Class Codes: C07H 19/10 : with the saccharide radical esterified by phosphoric or polyphosphoric acids
• CPC Class Codes: C07H 21/00 : Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids
• CPC Class Codes: C07K 1/04 : on carriers C07K1/003, C07K1/006 take precedence
• CPC Class Codes: C07K 1/042 : characterised by the nature of the carrier
• CPC Class Codes: C07K 1/045 : using devices to improve synthesis, e.g. reactors, special vessels
• CPC Class Codes: C07K 1/047 : Simultaneous synthesis of different peptide species; Peptide libraries
• CPC Class Codes: C07K 1/062 : for alpha- or omega-carboxy functions
• CPC Class Codes: C07K 17/06 : attached to the carrier via a bridging agent
• CPC Class Codes: C07K 17/14 : Peptides being immobilised on, or in, an inorganic carrier
• CPC Class Codes: C07K 7/06 : having 5 to 11 amino acids
• CPC Class Codes: C08G 69/00 : Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule products obtained from isocyanates or isothiocyanates C08G18/00; polyamide-imides C08G73/14
• CPC Class Codes: C12Q 1/6809 : Methods for determination or identification of nucleic acids involving differential detection
• CPC Class Codes: C12Q 1/6816 : characterised by the detection means C12Q1/6804 takes precedence
• CPC Class Codes: C12Q 1/6837 : using probe arrays or probe chips C12Q1/6874 takes precedence
• CPC Class Codes: C12Q 1/6874 : involving nucleic acid arrays, e.g. sequencing by hybridisation
• CPC Class Codes: C40B 40/06 : Libraries containing nucleotides or polynucleotides, or derivatives thereof
• CPC Class Codes: C40B 40/10 : Libraries containing peptides or polypeptides, or derivatives thereof
• CPC Class Codes: C40B 60/14 : for creating libraries
• CPC Class Codes: C40B 80/00 : Linkers or spacers specially adapted for combinatorial chemistry or libraries, e.g. traceless linkers or safety-catch linkers
• CPC Class Codes: G01N 15/1433 : using image recognition
• CPC Class Codes: G01N 21/253 : for batch operation, i.e. multisample apparatus analytical automats G01N35/00
• CPC Class Codes: G01N 21/6428 : Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" in vivo A61B5/00; immunoassay G01N33/53
• CPC Class Codes: G01N 21/6452 : Individual samples arranged in a regular 2D-array, e.g. multiwell plates
• CPC Class Codes: G03F 7/00 : Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G03F 7/26 : Processing photosensitive materials; Apparatus therefor G03F7/12 - G03F7/24 take precedence
• CPC Class Codes: G03F 7/265 : Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
• CPC Class Codes: G03F 7/38 : Treatment before imagewise removal, e.g. prebaking G03F7/265 takes precedence
• CPC Class Codes: G11C 13/0014 : comprising cells based on organic memory material
• CPC Class Codes: G11C 13/0019 : comprising bio-molecules
• CPC Class Codes: H01L 25/50 : Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00 H01L21/50 takes precedence
• CPC Class Codes: H01L 2924/00 : Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 : Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: Y02P 20/55 : Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
• CPC Class Codes: Y10S 435/961 : including a step of forming, releasing, or exposing the antigen or forming the hapten-immunogenic carrier complex or the antigen per se
• CPC Class Codes: Y10S 435/968 : High energy substrates, e.g. fluorescent, chemiluminescent, radioactive
• CPC Class Codes: Y10S 435/969 : Multiple layering of reactants
• CPC Class Codes: Y10S 435/973 : Simultaneous determination of more than one analyte
• CPC Class Codes: Y10S 436/807 : Apparatus included in process claim, e.g. physical support structures
• CPC Class Codes: Y10S 436/809 : Multifield plates or multicontainer arrays
• CPC Class Codes: Y10T 428/31971 : Of carbohydrate
• CPC Class Codes: Y10T 436/2575 : Volumetric liquid transfer

Abstract

A method and apparatus for preparation of a substrate containing a plurality of sequences. Photoremovable groups are attached to a surface of a substrate. Selected regions of the substrate are exposed to light so as to activate the selected areas. A monomer, also containing a photoremovable group, is provided to the substrate to bind at the selected areas. The process is repeated using a variety of monomers such as amino acids until sequences of a desired length are obtained. Detection methods and apparatus are also disclosed.

Claims

1-104. -104. (canceled)

105. A method for forming a polymer array, the method comprising:

providing a substrate suitable for synthesizing polymer sequences;

forming an array, each one of a plurality of locations of the array having at least one strand end;

forming photosensitive protection on the strand ends;

selectively scanning and modulating at least one energy beam to expose a pattern on the photosensitive protection;

removing a protective group from selected strand ends based on the exposed pattern; and

adding a predetermined one or more polymeric subunits to the deprotected strand ends.

106. The method according to claim 105, wherein the forming photosensitive protection includes depositing a layer of photoresist to cover the strand ends.

107. The method according to claim 105, wherein the one or more energy beams includes light from an ultra-violet laser.

108. The method according to claim 105, wherein the polymer sequences are DNA sequences.

109. The method according to claim 105, wherein the substrate includes a plurality of wells formed on a major surface of the substrate.

110. The method according to claim 105, wherein the selectively scanning and modulating includes simultaneously scanning two or more beams of light from ultraviolet lasers.

111. A system for forming a polymer array on a substrate, the system comprising:

an energy-beam source that produces an energy beam;

a scanner configured to move the energy beam in a scanned pattern on the substrate;

a computer operatively coupled to the scanner to control the scanned pattern of energy according to a sequence definition for each of a plurality of desired polymer sequences being synthesized;

a reagent source configured to add one of a plurality of monomers at each end location of each of a plurality of strands formed on the substrate; and

apparatus to provide photosensitive protection that controls an order of monomers based on the scanned pattern of light.

112. The system according to claim 111, wherein the apparatus to provide photosensitive protection includes apparatus that deposits a layer of photoresist to cover the strand ends.

113. The system according to claim 111, wherein the energy-beam source includes an ultra-violet laser.

114. The system according to claim 111, wherein the polymer sequences are DNA sequences.

115. The system according to claim 111, wherein the substrate includes a plurality of wells formed on a major surface of the substrate.

116. The system according to claim 111, wherein the energy-beam source produces two or more beams of light from ultraviolet lasers.

117. The system according to claim 111, further comprising a modulator, operatively coupled to be controlled by the computer, that modulates an intensity of the light.

118. A system for forming a polymer array on a substrate, the system comprising:

means for scanning a pattern of energy on the substrate according to a sequence definition for each of a plurality of desired polymer sequences being synthesized on the substrate;

a reagent source configured to add one of a plurality of monomers at each end location of each of a plurality of strands formed on the substrate; and

means for providing photosensitive protection that controls an order of monomers based on the scanned pattern of light.

119. The system according to claim 118, wherein the apparatus to provide photosensitive protection includes apparatus that deposits a layer of photoresist to cover the strand ends.

120. The system according to claim 118, wherein the means for scanning includes an ultra-violet laser.

121. The system according to claim 118, wherein the polymer sequences are DNA sequences.

122. The system according to claim 118, wherein the means for scanning includes two or more beams of light from ultraviolet lasers.

123. The system according to claim 118, wherein the means for scanning includes a modulator for modulating an intensity of the light.

124. A system for forming a polymer microarray on a substrate, the system comprising:

a first ultraviolet laser;

a first scanner configured to move light from the first ultraviolet laser in a scanned pattern on the substrate;

a computer operatively coupled to the first scanner to control the scanned pattern of light according to a sequence definition for each of a plurality of desired polymer sequences being synthesized;

a reagent source configured to add one of a plurality of monomers at each end location of each of a plurality of strands formed on the substrate; and

apparatus to provide photoresist layer that is patterned by the scanned light pattern to controls an order of monomers based on the computer-controlled scanned pattern of light.

125. The system according to claim 124, wherein the polymer sequences are DNA sequences.

126. The system according to claim 124, wherein the substrate includes a plurality of wells formed on a major surface of the substrate.

127. The system according to claim 124, further comprising:

a second ultraviolet laser; and

a second scanner configured to move light from the second ultraviolet laser in a scanned pattern on the substrate, wherein the computer is operatively coupled to the second scanner to control the scanned pattern of light according to a sequence definition for each of a plurality of desired polymer sequences being synthesized.