Method and device for the subjective determination of abberations of higher order

• US 20050225750A1
• Filed: 01/28/2002
• Published: 10/13/2005
• Est. Priority Date: 01/27/2001
• Status: Active Grant

• Current Assignee: Carl Zeiss Meditec AG (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss Meditec AG (Carl-Zeiss-Stiftung)
• Inventors: Dick, Manfred, Maeusezahl, Holger, Schroeder, Eckhard
• Granted Patent: US 7,338,173 B2
• Time in Patent Office: Days
• US Class Current: 356/222
• CPC Class Codes: A61B 3/028 for testing visual acuity; for determination of refraction, e.g. phoropters

Abstract

The invention relates to a device for the subjective determination of aberrations of higher orders Xi in an optical system, in particular in an eye (5), comprising at least one observation channel (15) into which defined plates (20) can be introduced, the individual plates (20) having optically active structures (21) which correspond to a defined Zernike polynomial and to a defined amplitude, at least one order Xi of the Zernike polynomial being greater than two.

Claims

1-10. -10. (canceled)

11. A device for a subjective determination of aberrations of higher orders in an optical system, the device comprising:

an observation channel; and

a plurality of individual plates configured to be introduced into the observation channel, each plate having optically active structures corresponding to a defined Zernike polynomial and to a defined amplitude of the defined Zernike polynomial, the defined Zernike polynomial having an order greater than two.

12. The device as recited in claim 11, wherein the optical system includes an eye.

13. The device as recited in claim 11, wherein a set of the plurality of individual plates define a plate set, the plate set configured compensate aberrations corresponding to the defined Zernike polynomial.

14. The device as recited in claim 13, wherein the plate set includes a subset of the set of individual plates, each of the individual plates in the subset corresponding to a different defined amplitude for the defined Zernike polynomial.

15. The device as recited in claim 13, wherein the plate set is disposed on a circular disc.

16. The device as recited in claim 11, wherein the device is a phoropter.

17. The device as recited in claim 11, further comprising a target apparatus for the optical system.

18. The device as recited in claim 11, wherein the plates are made of glass or plastic.

19. The device as recited in claim 11, wherein the device is configured to determine a visual acuity.

20. The device as recited in claim 11, wherein the device is configured to optimize a resolution of an optical instrument.

21. The device as recited in claim 11, wherein the device is configured to correct a beam profile of a beam source.

22. The device as recited in claim 21, wherein the beam source is a laser diode.

23. The device as recited in claim 11, wherein the device is configured to individually correct a vision defect when using optical instruments.

24. A method for the subjective determination of an aberration of a special higher order X in an optical system, comprising:

in a first step, introducing a first plate into an observation channel of the optical system, the plate having optically active structures corresponding to a defined Zernike polynomial having an order X and to a defined amplitude of the defined Zernike polynomial, the order X being greater than 2;

in a second step, subjectively assessing a current wave deformation of the order X; and

in a third step repeating the first step with a second plate of different amplitude correction of the defined Zernike polynomial and repeating the second step of the subjective determination so as to select one of the first and second plates that subjectively best compensates the aberration of the special higher order X.

25. The method as recited in claim 24, wherein the optical system includes an eye.

26. A method for the subjective determination of aberrations of special higher orders X1 to Xn in an optical system, comprising:

in a first step, introducing a first plate into an observation channel of the optical system, the plate having optically active structures corresponding to a defined Zernike polynomial having an order X1 and to a defined amplitude of the defined Zernike polynomial, the order X1 being greater than 2;

in a second step, subjectively assessing a current wave deformation of the order X1; and

in a third step repeating the first step with a second plate of different amplitude correction of the defined Zernike polynomial and repeating the second step of the subjective determination so as to select one of the first and second plates that subjectively best compensates the aberration of the special higher order X1

in a fourth step, successively repeating the first and second steps for each defined Zernike polynomial having an order Xn, wherein Xn is greater than X1.

27. The method as recited in claim 26, wherein the optical system includes an eye.