Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

  • US 20050277780A1
  • Filed: 08/08/2005
  • Published: 12/15/2005
  • Est. Priority Date: 09/28/2000
  • Status: Active Grant
First Claim
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1. A reagent for use in a thin film deposition process, the reagent comprising Hf(NEtMe)4.

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