Reduction of Near Field Electro-Magnetic Scattering Using High Impedance Metallization Terminations
First Claim
1. A method of attenuating scattering electro-magnetic waves present on metallized areas within a mobile phone that are caused by components within the mobile phone, the method comprising varying the metallization pattern near an edge of the metallized area such that electric current due to scattering electro-magnetic waves present on the metallized area encounters higher impedances as it approaches the edge of the metallized area.
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Accused Products
Abstract
The present invention uses metallization termination techniques to reduce the electro-magnetic field scattering at the edges of metallized areas. The metallization termination techniques provide a gradual transition from high conductivity areas to high impedance areas. The mobile phone antenna illuminates the PCB allowing currents to flow on the PCB. When the currents reach edges of the PCB they flow through a region of increasingly high impedance without reflecting back or scattering.
18 Citations
16 Claims
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1. A method of attenuating scattering electro-magnetic waves present on metallized areas within a mobile phone that are caused by components within the mobile phone, the method comprising varying the metallization pattern near an edge of the metallized area such that electric current due to scattering electro-magnetic waves present on the metallized area encounters higher impedances as it approaches the edge of the metallized area.
- 2. A method of attenuating scattering electro-magnetic waves present on metallized areas within a mobile phone that are caused by components within the mobile phone, the method comprising placing discrete components near an edge of the metallized area such that electric current due to scattering electro-magnetic waves present on the metallized area encounters higher impedances due to the discrete components near the edge of the metallized area.
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7. A method of attenuating scattering electro-magnetic waves present on metallized areas within a mobile phone that are caused by components within the mobile phone, the method comprising placing capacitive gaps and inductive lines near an edge of the metallized area such that electric current due to scattering electro-magnetic waves present on the metallized area encounters higher impedances due to the capacitive gaps and inductive lines near the edge of the metallized area.
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8. A method of attenuating scattering electro-magnetic waves present on metallized areas within a mobile phone that are caused by components within the mobile phone, the method comprising placing multiple varying layers of conductivity near an edge of the metallized area such that electric current due to scattering electro-magnetic waves present on the metallized area encounters higher impedances due to the multiple varying layers of conductivity near the edge of the metallized area.
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9. A mobile phone that attenuates scattering electro-magnetic waves present on metallized areas within the mobile phone that are caused by components within the mobile phone, the mobile phone comprising:
a varied metallization pattern near an edge of metallized areas such that electric current due to scattering electro-magnetic waves present on the metallized areas encounters higher impedances as it approaches the edge of the metallized areas.
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10. A mobile phone that attenuates scattering electro-magnetic waves present on metallized areas within the mobile phone that are caused by components within the mobile phone, the mobile phone comprising:
discrete components placed near an edge of metallized areas such that electric current due to scattering electro-magnetic waves present on the metallized areas encounters higher impedances due to the discrete components near the edge of the metallized areas. - View Dependent Claims (11, 12, 13, 14)
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15. A mobile phone that attenuates scattering electro-magnetic waves present on metallized areas within the mobile phone that are caused by components within the mobile phone, the mobile phone comprising:
capacitive gaps and inductive lines placed near an edge of metallized areas such that electric current due to scattering electro-magnetic waves present on the metallized areas encounters higher impedances due to the capacitive gaps and inductive lines near the edge of the metallized areas.
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16. A mobile phone that attenuates scattering electro-magnetic waves present on metallized areas within the mobile phone that are caused by components within the mobile phone, the mobile phone comprising:
multiple varying layers of conductivity placed near an edge of metallized areas such that electric current due to scattering electro-magnetic waves present on the metallized areas encounters higher impedances due to the multiple varying layers of conductivity near the edge of the metallized areas.
Specification