Adaptable fixation for cylindrical magnetrons
First Claim
Patent Images
1. A method of attaching a cylindrical target to an endblock, comprising:
- forming a circular groove in an end portion of the target;
positioning a flange ring such that the flange ring encircles the target, the flange ring having an inner diameter that is equal to or greater than the outer diameter of the target;
inserting a retaining ring into the groove, the retaining ring extending about the target; and
subsequently clamping the target to a spindle by placing a clamp ring about the spindle and the flange ring, the flange ring position fixed along the axis of the target by the retaining ring.
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Abstract
A circular groove formed in the end of a cylindrical target allows a retaining ring and flange ring to be attached to the target. The target can then be clamped to an endblock. Targets configured for screw-on affixation may be converted for clamped affixation in this way. Endblocks configured for screw-on targets are modified to clamp targets by modifying or replacing spindles and adding clamp rings.
56 Citations
11 Claims
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1. A method of attaching a cylindrical target to an endblock, comprising:
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forming a circular groove in an end portion of the target;
positioning a flange ring such that the flange ring encircles the target, the flange ring having an inner diameter that is equal to or greater than the outer diameter of the target;
inserting a retaining ring into the groove, the retaining ring extending about the target; and
subsequently clamping the target to a spindle by placing a clamp ring about the spindle and the flange ring, the flange ring position fixed along the axis of the target by the retaining ring. - View Dependent Claims (2, 3, 4)
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5. A cylindrical magnetron sputtering system, comprising:
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a cylindrical target having target material on an outer cylindrical surface and having a groove located in an end portion;
a retaining ring in the groove, the retaining ring having an inner diameter that is less than the diameter of the end portion and an outer diameter that is greater than the diameter of the end portion;
a flange ring that encircles the target, the flange ring having an inner diameter that is greater than the outer diameter of the end portion but is less than the outer diameter of the retaining ring so that the flange ring cannot pass over the retaining ring, the flange ring having an outer circumference;
a spindle having an outer circumference; and
a clamp ring that encircles the outer circumference of the flange ring and the outer circumference of the spindle. - View Dependent Claims (6, 7)
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8. A cylindrical target assembly for sputtering of target material in a cylindrical magnetron sputtering system, comprising:
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a target having target material on an outer cylindrical surface and having a circular groove located in an end portion;
a retaining ring in the groove, the retaining ring having an inner diameter that is less than the diameter of the end portion and an outer diameter that is greater than the diameter of the end portion; and
a flange ring that encircles the target, the flange ring having an inner diameter that is greater than the outer diameter of the end portion but is less than the outer diameter of the retaining ring so that the flange ring cannot pass over the retaining ring.
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9. A method of modifying a cylindrical magnetron configured for cylindrical targets having threaded ends to operate with cylindrical targets having flanges, comprising:
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removing a threaded collar from an endblock, the threaded collar extending around a spindle, the threaded collar having a threaded inner surface;
attaching an adaptor flange to the spindle, the adaptor flange having an outer circumference;
placing a clamp ring about the outer circumference of the adaptor flange and about a flange attached to a first end of a target; and
tightening the clamp ring to exert force both inwards in a radial direction and inwards along the axis of the target. - View Dependent Claims (10, 11)
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Specification