Chuck with integrated wafer support
First Claim
Patent Images
1. A probe station comprising:
- (a) a chamber that at least partially encloses a chuck assembly therein;
(b) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(c) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer;
(d) said members and said upper surface capable of relative vertical movement with respect to one another;
(e) said chuck assembly movable from a location completely within said chamber to a location at least partially outside said chamber.
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Accused Products
Abstract
An improved chuck with lift pins within a probe station.
28 Citations
19 Claims
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1. A probe station comprising:
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(a) a chamber that at least partially encloses a chuck assembly therein;
(b) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(c) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer;
(d) said members and said upper surface capable of relative vertical movement with respect to one another;
(e) said chuck assembly movable from a location completely within said chamber to a location at least partially outside said chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer;
(c) said members and said upper surface capable of relative vertical movement with respect to one another;
(d) said chuck assembly inhibited from lateral movement when said plurality of members are fully extended. - View Dependent Claims (11, 12, 13, 14)
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15. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer;
(c) said members and said upper surface capable of relative vertical movement with respect to one another;
(d) increasing a vacuum provided to said upper surface as a result of decreasing the extension of said plurality of members, where said plurality of members are not substantially even with said upper surface. - View Dependent Claims (16, 17)
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18. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer;
(c) said members and said upper surface capable of relative vertical movement with respect to one another;
(d) said chuck assembly inhibited from lateral movement when said plurality of members are at a first height above said upper surface and free from being inhibited when said plurality of members are at a second height above said upper surface, wherein said first height is greater than said second height.
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19. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer;
(c) said members and said upper surface capable of relative vertical movement with respect to one another;
(d) said chuck assembly inhibited from relative movement of said members to a position above said upper surface when said shuck assembly is in a position suitable for probing said wafer.
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Specification