Washing apparatus with bubbling reaction and a washing method of using bubbling reaction

• US 20070131254A1
• Filed: 05/04/2006
• Published: 06/14/2007
• Est. Priority Date: 12/13/2005
• Status: Abandoned Application

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Hsu, Ching-Yi, Chen, Chiou-Mei, Kin, Kon-Tsu, Kuo, Yung-Chi
• Application Number:
  US11/417,032
• Publication Number:
  US 20070131254A1
• Time in Patent Office: Days
• US Class Current: 134/26
• CPC Class Codes: B08B 3/08 the liquid having chemical or dissolving effect substances used, see the relevant classes
• CPC Class Codes: B08B 3/10 with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
• CPC Class Codes: B08B 3/102 with means for agitating the liquid by agitating the container B08B3/042, B08B3/044, B08B3/045, B08B3/06
• CPC Class Codes: G03F 7/423 containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
• CPC Class Codes: H01L 21/67057 with the semiconductor substrates being dipped in baths or vessels

Abstract

The present invention relates to a washing apparatus with bubbling reaction and a washing method of using bubbling reaction which are based on compression technology of an interface diffusion layer with bubbling, by the aid of using a bubble wall generated by a pneumatic means as a reaction interface in a gas-liquid-solid heterogeneous system and utilizing a pulling force generated by bubbles when climbing up along the surface of a material to be washed, to compress thickness of the liquid-solid interface and optimize mass transfer efficiency in multiphase that can remove organic matter from the material surface.

Claims

1. A washing apparatus with bubbling reaction, which uses a bubbling reaction to remove organic matter from the surface of a substrate and includes

a reaction tank, which is used to place said substrate and provide said substrate with washing space;

a source for supplying a reaction gas, which connects with said reaction tank and supplies said reaction tank with a reaction gas;

a source for supplying reaction liquid;

a temperature-control system, which connects with said source for supplying reaction liquid, and controls the temperature of said reaction liquid, and then supplies said reaction liquid to said reaction tank;

a bubble-generating means, which generate bubbles in said reaction gas after receiving in the reaction liquid;

a motion unit, which is used to let said substrate generate rotational displacement in said reaction tank;

a pressure-control system, which connects with said reaction tank, controls the pressure in the reaction tank, and extracts said surplus reaction gas from said reaction tank; and

a source for supplying a washing solution, which supplies the washing solution to wash said substrate after said organic matter is removed.

2. A washing apparatus with bubbling reaction according to claim 1, wherein said reaction gas is selected from the group consisting of ozone and a mixed gas containing ozone.

3. A washing apparatus with bubbling reaction according to claim 2, wherein the concentration of said reaction gas in the reaction liquid is in a range of from 1% to 17%.

4. A washing apparatus with bubbling reaction according to claim 2, wherein said ozone is generated by using a high-voltage electric field and/or ultraviolet (UV) irradiation.

5. A washing apparatus with bubbling reaction according to claim 1, wherein said reaction liquid is selected from the group consisting of de-ionized water (DI-water), aqueous ozone, and a solution adjusted at an appropriate pH by adding HCl, H₂SO₄ or NH₄OH.

6. A washing apparatus with bubbling reaction according to claim 1, wherein said temperature-control system controls the temperature of said reaction liquid in the range of from room temperature to 80°

C.

7. A washing apparatus with bubbling reaction according to claim 1, wherein said reaction tank hold said reaction liquid forming a horizontal plane interiorly.

8. A washing apparatus with bubbling reaction according to claim 1, wherein said motion unit further comprises a fixed means for fixing said substrate on said motion unit.

9. A washing apparatus with bubbling reaction according to claim 1, wherein said rotational displacement is rotational motion with the rotational rate ranging from 1 to 10 rpm.

10. A washing apparatus with bubbling reaction according to claim 1, wherein said bubble-generating means is a pipe made from a material capable against erosion of ozone on which surface at least one exhaust outlet is installed or said bubble-generating means is a gas distributor disc, and said bubble-generating means is located below said horizontal plane of said reaction liquid.

11. A washing apparatus with bubbling reaction according to claim 1, wherein after removing said organic matter, said substrate is subjected to a washing procedure in said reaction tank or in another washing tank.

13. A washing method of using bubbling reaction according to claim 1, wherein part of said substrate is soaked in said reaction liquid, and the height of the water level soaking said substrate occupies from 5% to 80% of the diameter of said substrate.

14. A washing method of using bubbling reaction according to claim 13, wherein the angle between said substrate and the plane of said reaction liquid is in a range of from 5°

to 90°

.

12. A washing method of using bubbling reaction, which uses a bubbling reaction to remove organic matter from a surface of a substrate and includes the steps of

placing said substrate into a reaction tank and supplying a reaction gas at appropriate concentration and flow rate;

delivering said reaction gas through a reaction liquid with an appropriate temperature to generate bubbles;

allowing said bubbles climb up along said surface of said substrate and remove said organic matter from said surface of said substrate; and

allowing said substrate conduct a washing procedure by using a washing solution.

15. A washing method of using bubbling reaction according to claim 12, wherein said organic matter from said substrate is further assisted with a rotational motion at a rotational rate in the range of from 1 rpm to 10 rpm.

16. A washing method of using bubbling reaction according to claim 12, wherein the exhaust outlet of said reaction gas is located below said substrate and said reaction liquid.

17. A washing method of using bubbling reaction according to claim 12, wherein said substrate is a semiconductor wafer or a glass substrate.

18. A washing method of using bubbling reaction according to claim 12, wherein said organic matter is a photoresist or organic contaminant during its production.

19. A washing method of using bubbling reaction according to claim 12, wherein said rotational motion, the concentration of said reaction gas, the flow rate of said reaction gas, the temperature of said reaction liquid, and the height of the water level of said reaction liquid is optionally varied at any time during removing said organic matter.

20. A washing method of using bubbling reaction according to claim 12, wherein said reaction gas is selected from the group consisting of ozone and a mixed gas containing ozone.

21. A washing method of using bubbling reaction according to claim 20, wherein the concentration of said reaction gas is in a range of from 1% to 17%.

22. A washing method of using bubbling reaction according to claim 20, wherein said ozone is generated by using a high-voltage electric field and/or an ultraviolet (UV) irradiation.

23. A washing method of using bubbling reaction according to claim 12, wherein said reaction liquid is selected from the group consisting of deionized water (DI-water), aqueous ozone, and a solution adjusted at an appropriate pH by using HCl, H₂SO₄ or NH₄OH.

24. A washing method of using bubbling reaction according to claim 12, wherein the temperature of said reaction liquid is in a range of from room temperature to 80°

C.

25. A washing method of using bubbling reaction according to claim 12, wherein said washing solution entering into said reaction tank is infused either from the top or from the bottom.

26. A washing method of using bubbling reaction according to claim 12, wherein said washing procedure can be carried out by soaking, showering, or spraying.