PLASMA PROCESSING METHOD AND APPARATUS, CONTROL PROGRAM AND STORAGE MEDIUM
First Claim
1. A plasma processing method for performing a plasma process by employing a plasma processing apparatus, the plasma processing apparatus including a processing chamber for performing the plasma process on a target object, a mounting table for mounting thereon the target object in the processing chamber, a peripheral member disposed around a periphery of the mounting table, and a voltage application unit,wherein the voltage application unit applies a voltage to the peripheral member based on an amount of abrasion of the peripheral member.
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Accused Products
Abstract
A plasma processing method for performing a plasma process by employing a plasma processing apparatus including a processing chamber for performing the plasma process on a target object, a mounting table for mounting thereon the target object in the processing chamber, a peripheral member disposed around a periphery of the mounting table, and a voltage application unit. The voltage application unit applies a voltage to the peripheral member based on an amount of abrasion of the peripheral member, a result of a pre-performed processing or a variation of an electric field formed over the peripheral member.
24 Citations
16 Claims
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1. A plasma processing method for performing a plasma process by employing a plasma processing apparatus, the plasma processing apparatus including a processing chamber for performing the plasma process on a target object, a mounting table for mounting thereon the target object in the processing chamber, a peripheral member disposed around a periphery of the mounting table, and a voltage application unit,
wherein the voltage application unit applies a voltage to the peripheral member based on an amount of abrasion of the peripheral member.
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4. A plasma processing method for performing a plasma process by employing a plasma processing apparatus, the plasma processing apparatus including a processing chamber for performing the plasma process on a target object, a mounting table for mounting thereon the target object in the processing chamber, a peripheral member disposed around a periphery of the mounting table, and a voltage application unit,
wherein the voltage application unit applies a voltage to the peripheral member based on a result of a pre-performed plasma process.
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5. A plasma processing method for performing a plasma process by employing a plasma processing apparatus, the plasma processing apparatus including a processing chamber for performing the plasma process on a target object, a mounting table for mounting thereon the target object in the processing chamber, a peripheral member disposed around a periphery of the mounting table, a voltage application unit, and a monitoring device for monitoring a state of an electric field formed over the peripheral member,
wherein the monitoring device detects a variation of the electric field formed over the peripheral member, and the voltage application unit applies a voltage to the peripheral member based on the detection result.
Specification