PLASMA PROCESSING METHOD AND APPARATUS, CONTROL PROGRAM AND STORAGE MEDIUM

  • US 20070224709A1
  • Filed: 03/22/2007
  • Published: 09/27/2007
  • Est. Priority Date: 03/23/2006
  • Status: Abandoned Application
First Claim
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1. A plasma processing method for performing a plasma process by employing a plasma processing apparatus, the plasma processing apparatus including a processing chamber for performing the plasma process on a target object, a mounting table for mounting thereon the target object in the processing chamber, a peripheral member disposed around a periphery of the mounting table, and a voltage application unit,wherein the voltage application unit applies a voltage to the peripheral member based on an amount of abrasion of the peripheral member.

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