Spectrally Efficient Photodiode For Backside Illuminated Sensor
First Claim
1. A backside illuminated sensor, comprising:
- a semiconductor substrate having a front surface and a back surface;
a plurality of pixels formed on the front surface of the semiconductor substrate;
a dielectric layer disposed above the front surface of the semiconductor substrate; and
a plurality of array regions arranged according to the plurality of pixels, wherein at least two of the array regions have a different radiation response characteristic from each other.
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Abstract
A backside illuminated sensor includes a semiconductor substrate having a front surface and a back surface and a plurality of pixels formed on the front surface of the semiconductor substrate. A dielectric layer is disposed above the front surface of the semiconductor substrate. The sensor further includes a plurality of array regions arranged according to the plurality of pixels. At least two of the array regions have a different radiation response characteristic from each other, such as the first array region having a greater junction depth than the second array region, or the first array region having a greater dopant concentration than the second array region.
95 Citations
20 Claims
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1. A backside illuminated sensor, comprising:
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a semiconductor substrate having a front surface and a back surface; a plurality of pixels formed on the front surface of the semiconductor substrate; a dielectric layer disposed above the front surface of the semiconductor substrate; and a plurality of array regions arranged according to the plurality of pixels, wherein at least two of the array regions have a different radiation response characteristic from each other. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for forming a backside illuminated sensor, comprising:
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providing a semiconductor substrate having a front surface and a back surface; forming first and second pixels on the front surface of the semiconductor substrate; forming a first doped region of the substrate, aligned with the first pixel; and forming a second doped region of the substrate, aligned with the second pixel; wherein the first and second doped regions are formed to possess a different radiation response characteristic from each other. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification