High profile contacts for microelectromechanical systems
First Claim
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1. An apparatus comprising:
- a substrate;
a first electrode layer over the substrate; and
a second electrode layer over the first electrode layer,wherein the second electrode layer comprises a first portion and a second portion, the first portion of the second electrode layer configured to move between a relaxed position spaced away from the first electrode layer and an actuated position spaced closer to the first electrode layer than is the relaxed position, the second portion of the second electrode layer comprising at least one electrical contact having an end extending generally away from the substrate.
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Abstract
In certain embodiments, an interferometric modulator includes a substrate, a first electrode layer over the substrate, and a second electrode layer over the first electrode layer. The second electrode layer includes a first portion and a second portion. The first portion of the second electrode layer is configured to move between a relaxed position spaced away from the first electrode layer and an actuated position spaced closer to the first electrode layer than is the relaxed position. The second portion of the second electrode layer includes at least one electrical contact having an end extending generally away from the substrate.
110 Citations
41 Claims
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1. An apparatus comprising:
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a substrate; a first electrode layer over the substrate; and a second electrode layer over the first electrode layer, wherein the second electrode layer comprises a first portion and a second portion, the first portion of the second electrode layer configured to move between a relaxed position spaced away from the first electrode layer and an actuated position spaced closer to the first electrode layer than is the relaxed position, the second portion of the second electrode layer comprising at least one electrical contact having an end extending generally away from the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. An apparatus comprising:
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means for supporting the apparatus; first means for applying a voltage to the apparatus, the first applying means over the supporting means; second means for applying a voltage to the apparatus, the second applying means over the first applying means; and means for transmitting an electrical signal to the second applying means, the transmitting means having an end extending generally away from the supporting means, wherein the transmitting means and the second applying means are both portions of a common layer. - View Dependent Claims (22, 23, 24, 25)
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26. A method of fabricating a microelectromechanical systems (MEMS) device, comprising:
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forming an electrode layer over a first portion of a substrate; forming a first sacrificial layer over the electrode layer, forming a second sacrificial layer over a second portion of the substrate; forming a metal layer over the first sacrificial layer and over the second sacrificial layer; removing the first sacrificial layer to create a gap between the metal layer and the electrode layer; and removing the second sacrificial layer to allow a portion of the metal layer over the second portion of the substrate to bend away from the substrate. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41)
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Specification