Method of plasma processing
First Claim
1. A method of processing a substrate using a plasma, comprising:
- providing a lower electrode in a processing chamber, the lower electrode having a supporting surface for supporting the substrate and a side surface connected to an outer perimeter of the supporting surface, the supporting surface having a size approximately the same as, or smaller than, a size of the substrate;
supporting the substrate on the supporting surface;
covering the side surface of the lower electrode by a side surface protecting ring formed of a ceramic material;
positioning an outer perimeter of the most outside part of the side surface protecting ring inside an outer perimeter of the substrate supported on the supporting surface;
surrounding the side surface of the lower electrode, which is covered by the side surface protecting ring, by a focus ring formed of a first material different from the ceramic material; and
processing a surface of the substrate by generating a plasma in the processing chamber, the processing including;
preventing, by the side surface protecting ring, the plasma from touching the side surface of the lower electrode; and
preventing, by the substrate supported on the supporting surface, charged particles in the plasma accelerated toward a direction perpendicular to the surface of the substrate from irradiating the side surface protecting ring.
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Abstract
Plasma processing apparatus and plasma processing methods capable of maintaining etching characteristics and to prevent degradation of a lower electrode even when the focus ring is severely eroded by the plasma are disclosed. According to an exemplary embodiment, a side-surface protecting ring formed of a ceramic material having an erosion rate by the plasma lower than an erosion rate of the material of the focus ring is provided to cover the side surface of the lower electrode. As a result, it becomes possible to prevent the side surface of the lower electrode from being exposed to the plasma and maintain the etching characteristics even after the focus ring is severely eroded. Further, degradation of the lower electrode is decreased.
9 Citations
11 Claims
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1. A method of processing a substrate using a plasma, comprising:
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providing a lower electrode in a processing chamber, the lower electrode having a supporting surface for supporting the substrate and a side surface connected to an outer perimeter of the supporting surface, the supporting surface having a size approximately the same as, or smaller than, a size of the substrate;
supporting the substrate on the supporting surface;
covering the side surface of the lower electrode by a side surface protecting ring formed of a ceramic material;
positioning an outer perimeter of the most outside part of the side surface protecting ring inside an outer perimeter of the substrate supported on the supporting surface;
surrounding the side surface of the lower electrode, which is covered by the side surface protecting ring, by a focus ring formed of a first material different from the ceramic material; and
processing a surface of the substrate by generating a plasma in the processing chamber, the processing including;
preventing, by the side surface protecting ring, the plasma from touching the side surface of the lower electrode; and
preventing, by the substrate supported on the supporting surface, charged particles in the plasma accelerated toward a direction perpendicular to the surface of the substrate from irradiating the side surface protecting ring. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of processing a substrate using a plasma, comprising:
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providing a lower electrode in a processing chamber, the lower electrode having a supporting surface for supporting the substrate and a side surface connected to an outer perimeter of the supporting surface, the supporting surface having a size smaller than a size of the substrate;
supporting the substrate on the supporting surface;
covering the side surface of the lower electrode by a side surface protecting ring formed of a ceramic material;
positioning an outer perimeter of the most outside part of the side surface protecting ring inside an outer perimeter of the substrate supported on the supporting surface;
surrounding the side surface of the lower electrode, which is covered by the side surface protecting ring, by a focus ring formed of quartz;
processing a surface of the substrate by generating a plasma in the processing chamber, the processing including;
preventing, by the side surface protecting ring, the plasma from touching the side surface of the lower electrode; and
preventing, by the substrate supported on the supporting surface, charged particles in the plasma accelerated toward a direction perpendicular to the surface of the substrate from irradiating the side surface protecting ring. - View Dependent Claims (9, 10, 11)
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Specification