Coating of a Polymer Layer Using Low Powder Pulsed Plasma in a Plasma Chamber of a Large Volume
First Claim
1. A method for depositing a polymeric material onto a substrate, the method comprising introducing a monomeric material in a gaseous state into a plasma deposition chamber in which a plasma zone has a volume of at least 0.5 m3, igniting a glow discharge within said chamber, and applying a voltage as a pulsed field, at a power of from 0.001 to 500 w/m3 for a sufficient period of time to allow a polymeric layer to form on the surface of the substrate.
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Abstract
A method for depositing a polymeric material onto a substrate, said method comprising introducing an organic monomeric material in a gaseous state into a plasma deposition chamber, igniting a glow discharge within said chamber, and applying a high frequency voltage as a pulsed field, at a power of from 0.001 to 500 w/m3 for a sufficient period of time to allow a polymeric layer to form on the surface of the substrate. The method is particularly suitable for producing oil and water repellent coatings, in particular where the monomeric material contains haloalkyl compounds. Apparatus particularly adapted to carry out the method of the invention is also described and claimed.
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20 Claims
- 1. A method for depositing a polymeric material onto a substrate, the method comprising introducing a monomeric material in a gaseous state into a plasma deposition chamber in which a plasma zone has a volume of at least 0.5 m3, igniting a glow discharge within said chamber, and applying a voltage as a pulsed field, at a power of from 0.001 to 500 w/m3 for a sufficient period of time to allow a polymeric layer to form on the surface of the substrate.
- 17. An apparatus for depositing a polymeric material onto a substrate, the apparatus comprises a plasma deposition chamber, at least two electrodes arranged so as to ignite a plasma within the chamber, a pump system arranged to feed monomer gas into the chamber, and power control means programmed to pulse power supplied to the electrodes so as to produce a plasma at a power of from 0.001 to 500 w/m3 within a plasma zone within the chamber, the plasma zone having a volume of at least 0.5 m3.
Specification