Method for Producing Internal Antenna with Anti-Electromagnetic Interference Property Through Vacuum Process

• US 20090101494A1
• Filed: 07/21/2008
• Published: 04/23/2009
• Est. Priority Date: 10/19/2007
• Status: Abandoned Application

• Current Assignee: Mitac Precision Technology Limited (MiTAC Holdings Corp.)
• Original Assignee: Mitac Precision Technology Limited (MiTAC Holdings Corp.)
• Inventors: WU, Cheng-Tao, CHANG, Ping-Chen
• Application Number:
  US12/176,708
• Publication Number:
  US 20090101494A1
• Time in Patent Office: Days
• US Class Current: 204/192.150
• CPC Class Codes: H01Q 1/2266 disposed inside the computer

Abstract

A method for producing an internal antenna with an anti-electromagnetic interference property by performing a vacuum process, which includes (1) performing a surface pretreatment process on an insulating substrate to clean the surface thereof, (2) placing the substrate into a vacuum chamber, and performing a first plasma bombardment by using a conductive target material; (3) placing the substrate into another vacuum chamber, and performing a second plasma bombardment by using a passivation target material; (4) removing a certain part of the passivation layer and the conductive layer, such that a planar antenna pattern is remained with a certain distance spaced apart from the surrounding passivation layer and conductive layer. The conductive layer and the passivation layer cover the surface of the substrate for completely shielding the electromagnetic interference, and meanwhile, the planar shape of the antenna saves the cost and the available space within the housing.

Claims

1. A method for producing an internal antenna with anti-electromagnetic interference property by performing a vacuum process, comprising:

(a) performing a surface pretreatment process on an insulating substrate to clean the surface of the insulating substrate;

(b) performing a vacuum process, comprising;

(b-1) sputtering a conductive layer on the insulating substrate, wherein the insulating substrate is placed into a vacuum chamber and a first plasma bombardment is performed by using a conductive target material, such that surface components of the conductive target material are sputtered in a form of atoms for being deposited and covered on the whole insulating substrate;

(b-2) sputtering a passivation layer on the conductive layer, wherein the insulating substrate is placed into another vacuum chamber, and a second plasma bombardment is performed by using a passivation target material, such that surface components of the passivation target material are sputtered in as a form of atoms for being deposited and covered on the conductive layer; and

(c) removing a certain part of the passivation layer and the conductive layer, so that a planar antenna pattern is remained with a certain distance spaced apart from the surrounding passivation layer and conductive layer.

2. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein the conductive layer comprises Cu or Ag.

3. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein thickness of the conductive layer is 0.3-5 μ

m.

4. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein the passivation layer comprises stainless steel, Ni, Cr, or Ni—

Cr alloy.

5. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein thickness of the passivation layer is 0.1-0.5 μ

m.

6. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein the insulating substrate comprises polycarbonate (PC), a mixture of PC and acrylonitrile butadiene styrene (ABS) copolymer, a mixture of PC and fiber, a mixture of PC, ABS, and fiber, nylon or a mixture of nylon and fiber.

7. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein a laser carving technique is performed in Step (c) for the removing process.

8. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein the antenna pattern is spaced apart from the surrounding passivation layer and conductive layer for 2-10 mm.

9. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein the surface pretreatment in Step (a) comprises degreasing, ultrasonic cleaning, and drying.

10. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 1, wherein Steps (b-1) and (b-2) are performed in the same vacuum chamber.

11. A method for producing an internal antenna with anti-electromagnetic interference property by performing a vacuum process, comprising:

(a) performing a surface pretreatment process on an insulating substrate to clean the surface of the insulating substrate;

(b) performing a vacuum process, comprising;

(b-1) sputtering a conductive layer on the insulating substrate, wherein the insulating substrate is placed into a vacuum chamber and a first evaporation process is performed to vaporize a conductive material, such that the conductive material is deposited on the whole insulating substrate to form the conductive layer after performing a cooling process;

(b-2) sputtering a passivation layer on the conductive layer, wherein the insulating substrate is placed into another vacuum chamber, and a second evaporation process is performed to vaporize a passivation material, such that the passivation material is deposited on the conductive layer to form the passivation layer after performing a cooling process; and

(c) removing a certain part of the passivation layer and the conductive layer, so that a planar antenna pattern is remained with a certain distance spaced apart from the surrounding passivation layer and conductive layer.

12. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein the conductive layer comprises Cu or Ag.

13. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein thickness of the conductive layer is 0.3-5 μ

m.

14. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein the passivation layer comprises stainless steel, Ni, Cr, or Ni—

Cr alloy.

15. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein thickness of the passivation layer is 0.1-0.5 μ

m.

16. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein the insulating substrate comprises polycarbonate (PC), a mixture of PC and acrylonitrile butadiene styrene (ABS) copolymer, a mixture of PC and fiber, a mixture of PC, ABS, and fiber, nylon or a mixture of nylon and fiber.

17. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein a laser carving technique is performed in Step (c) for the removing process.

18. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein the antenna pattern is spaced apart from the surrounding passivation layer and conductive layer for 2-10 mm.

19. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein the surface pretreatment in Step (c) comprises degreasing, ultrasonic cleaning, and drying.

20. The method for producing the internal antenna with anti-electromagnetic interference property by performing a vacuum process as claimed in claim 11, wherein Steps (b-1) and (b-2) are performed in the same vacuum chamber.