SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
First Claim
1. A method of fabricating a semiconductor device comprising:
- forming a mask pattern defining an opening on a semiconductor substrate, the opening corresponding to an electrode pad formed on the semiconductor substrate;
forming a bump on the electrode pad by filling the opening defined by the mask pattern with a first material;
removing the mask pattern;
forming a sidewall film on sidewalls of the bump using a second material;
forming a connection member using a third material between an upper surface of the bump and a wire substrate so as to electrically connect the bump and the wire substrate; and
forming an underfill resin between the wire substrate and the semiconductor substrate,wherein a wetting angle between the second material and the third material is greater than a wetting angle between the first material and the third material.
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Accused Products
Abstract
Provided is a semiconductor device and a method of fabricating the same. The method of fabricating the semiconductor device includes forming a mask pattern having an opening corresponding to an electrode pad formed on a semiconductor substrate; forming a bump by filling the opening with a conductive first material; forming a sidewall film on sidewalls of the bump using a second material; forming a connection member between an upper surface of the bump and a wire substrate using a conductive third material in order to electrically connect the bump and the wire substrate; and forming an underfill resin between the wire substrate and the semiconductor substrate, wherein a wetting angle between the second material and the third material is greater than that between the first material and the third material.
68 Citations
20 Claims
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1. A method of fabricating a semiconductor device comprising:
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forming a mask pattern defining an opening on a semiconductor substrate, the opening corresponding to an electrode pad formed on the semiconductor substrate; forming a bump on the electrode pad by filling the opening defined by the mask pattern with a first material; removing the mask pattern; forming a sidewall film on sidewalls of the bump using a second material; forming a connection member using a third material between an upper surface of the bump and a wire substrate so as to electrically connect the bump and the wire substrate; and forming an underfill resin between the wire substrate and the semiconductor substrate, wherein a wetting angle between the second material and the third material is greater than a wetting angle between the first material and the third material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of fabricating a semiconductor device comprising:
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forming a mask pattern defining an opening on a semiconductor substrate, the opening corresponding to an electrode pad formed on the semiconductor substrate; forming a sidewall film using a second material on inner walls of the opening; forming a bump by filling the opening with a first material; removing the mask pattern; forming a connection member between an upper surface of the bump and a wire substrate using a third material to electrically connect the bump and the wire substrate; and forming an underfill resin between the wire substrate and the semiconductor substrate, wherein a wetting angle between the second material and the third material is greater than a wetting angle between the first material and the third material. - View Dependent Claims (15, 16, 17)
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18. A method of fabricating a semiconductor device comprising:
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forming a mask pattern defining an opening on a semiconductor substrate, the opening corresponding to an electrode pad formed on the semiconductor substrate; forming a bump on the electrode pad by filling the opening with a first material; removing the mask pattern; forming a sidewall film on sidewalls of the bump using a second material; forming a top film on an upper surface of the bump using a fourth material; and forming a connection member between the top film and a wire substrate using a third material so as to electrically connect the bump and the wire substrate; wherein a wetting angle between the second material and the third material is greater than a wetting angle between the fourth material and the third material. - View Dependent Claims (19, 20)
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Specification