SUSPENSION MICROSTRUCTURE AND A FABRICATION METHOD FOR THE SAME

  • US 20090243084A1
  • Filed: 10/02/2008
  • Published: 10/01/2009
  • Est. Priority Date: 12/14/2007
  • Status: Active Grant
First Claim
Patent Images

1. A suspension microstructure being formed with at least one insulation layer including inner micro-electro-mechanical structures on an upper surface of a silicon substrate, the micro-electro-mechanical structure including at least one microstructure and metal circuits that are independent from each other, the micro-electro-mechanical structures having an exposed portion on a surface of the insulation layer, the exposed portion being provided with through holes correspondingly to predetermined etching spaces of the micro-electro-mechanical structures, the etching spaces only penetrating the insulation layer, a photoresist with an opening being formed on the surface of the insulation layer, and the opening of the photoresist being located outside the though holes of the exposed portion.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×