Sub-Threshold Capfet Sensor for Sensing Analyte, A Method and System Thereof

• US 20110031986A1
• Filed: 06/19/2008
• Published: 02/10/2011
• Est. Priority Date: 04/11/2008
• Status: Abandoned Application

• Current Assignee: Indian Institute of Science
• Original Assignee: Indian Institute of Science
• Inventors: Pratap, Rudra, Shivashankar, S.A., Jayaraman, Balaji, Bhat, Navakanta
• Application Number:
  US12/937,243
• Publication Number:
  US 20110031986A1
• Time in Patent Office: Days
• US Class Current: 324/686
• CPC Class Codes: G01N 27/4143 Air gap between gate and channel, i.e. suspended gate [SG] FETs work function measurement per se G01N27/002

Abstract

The present invention relates to high sensitivity chemical sensors, more particularly relates to high sensitivity chemical sensors which are capacitively coupled, FET based analyte sensors. A sub-threshold capacitively coupled Field Effect Transistor (CapFET) sensor for sensing an analyte comprises fixed dielectric placed on substrate of the CapFET and second dielectric sensitive to the analyte, placed between gate terminal of the CapFET and the fixed dielectric, wherein presence of the analyte alters either dielectric constant of the second dielectric or work function of the gate.

Claims

1. A sub-threshold Capacitively coupled Field Effect Transistor (CapFET) sensor for sensing an analyte comprising:

a. fixed dielectric placed on substrate of the CapFET, and

b. second dielectric sensitive to the analyte, placed between gate terminal of the CapFET and the fixed dielectric, wherein presence of the analyte alters either dielectric constant of the second dielectric or work function of the gate.

2. The sensor as claimed in claim 1, wherein the second dielectric is selected from a group comprising analyte-sensitive film, fluid and air.

3. The sensor as claimed in claim 1, wherein the analyte is selected from a group comprising gas, bio-particles and fluid.

4. The sensor as claimed in claim 1, wherein the dielectric constant of the fluid is changed due to change in concentration of relative constituents of the fluid.

5. The sensor as claimed in claim 2, wherein presence or absence of the fluid under the gate determines the effective dielectric constant of the layer.

6. The sensor as claimed in claim 5, wherein the absence of the fluid under the gate is filled with air.

7. The sensor as claimed in claims 1, wherein said sensor arranged in an array to extract velocity of the fluid.

8. The sensor as claimed in claim 1, wherein the alteration in dielectric constant of the second dielectric due to presence of the analyte varies gate capacitance of the sensor.

9. The sensor as claimed in claim 3, wherein the gas flows between the gate terminal of the CapFET biased in sub-threshold region and the fixed dielectric and gets adsorbed on the gate, leading to change in the work function of the gate.

10. The sensor as claimed in claim 1, wherein the fixed dielectric is selected from a group comprising silicon dioxide, high-K material, preferably silicon dioxide.

11. The sensor as claimed in claim 1, wherein the alteration in dielectric constant of the second dielectric or the work function of the gate leads to change in the threshold voltage (V_T) of the CapFET biased in sub-threshold region.

12. The sensor as claimed in claim 11, wherein the V_T adjusted by varying the substrate doping concentration (N_A).

13. The sensor as claimed in claim 1, wherein said sensor is operated in sub-threshold region by applying constant gate-to-source voltage (V_GS), wherein the gate-to-source voltage (V_GS) is less than threshold voltage (V_T) of the sensor.

14. The sensor as claimed in claim 1, wherein the alteration in the dielectric constant of the second dielectric or the work function of the gate provides for an exponential change in drain current (I_D) of the sensor.

15. The sensor as claimed in claim 1, wherein the sensor is built on a Silicon-On-Insulator (SOI) substrate comprising a thin film of Silicon resting on an oxide layer which is buried in the Silicon.

16. The sensor as claimed in claim 1, wherein the sensor is operated in fully-depleted (FD) mode for enhanced sensitivity.

17. The sensor as claimed in claim 1, wherein the CapFETs sensing layer (T_Sens) silicon film (T_Si) and buried-oxide layer (T_box) thickness are optimized for redetermined thickness (T_Ox) of SiO₂ layer and for a given dielectric constant, to obtain maximum sensitivity.

18. The sensor as claimed in claim 1, wherein the substrate is selected from a group of semi-conducting material comprising Germanium, Silicon and Gallium Arsenide.

19. The sensor as claimed in claim 1, wherein said sensor is integrated into standard CMOS process flow on a SOI substrate.

20. The sensor as claimed in claim 1, wherein the sensor is implemented as Partially Depleted SOI (PDSOI) or Dynamically Depleted SOI (DDSOI), or bulk MOSFET or other similar device structure.

21. The sensor as claimed in claim 1, wherein said sensor is implemented either with Polysilicon gate and diffused source/drain junctions or with metal gate and Schottky source/drain junctions, or any combination thereof.

22. A method to sense analyte using sub-threshold CapFET sensor comprising an act of observing change in drain current (I_D) of the sensor due to change in either dielectric constant (K) of second dielectric or work function of gate material, by presence of the analyte.

23. The method as claimed in claim 22, wherein the change in either the dielectric constant of the second dielectric or the work function of the gate material depends on the presence of the analyte or the flow of fluid.

24. The method as claimed in claim 22, wherein the sensor is operated in sub-threshold region by applying constant gate-to-source voltage (V_GS), wherein the voltage (V_GS) is less than threshold voltage (V_T) of the sensor.

25. The method as claimed in claim 22, wherein the change in drain current (I_D) is exponential.

26. A system to detect presence of analyte comprising:

a. a sub-threshold CapFET sensor having a fixed dielectric on substrate of the CapFET, and a second dielectric sensitive to analyte, placed between gate terminal of the CapFET and the fixed dielectric, wherein the presence of the analyte or flow of fluid alters either dielectric constant of the second dielectric or work function of the gate, resulting in an exponential change in the drain current (I_D) of the sensor,

b. a means to operate the sensor in sub-threshold region by applying constant gate-to-source voltage (V_GS), wherein the voltage (V_GS) is less than threshold voltage (V_T) of the sensor, and

c. a means to sense the change in drain current (I_D) to detect the presence of the analyte.