Methods and Apparatus for Forming Multi-Layer Structures Using Adhered Masks
First Claim
1. A method for forming an alignment target on a substrate, comprising:
- forming a first patternable mold material on the substrate;
patterning the first patternable mold material to form a first aperture;
forming a first material in the first aperture to form an alignment target within the first aperture;
removing the first patternable mold material;
forming a second patternable mold material on the substrate so as to cover the alignment target; and
forming the second patternable mold material to form a second aperture wider than and fully enclosing the alignment target.
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Abstract
Numerous electrochemical fabrication methods and apparatus are provided for producing multi-layer structures (e.g. having meso-scale or micro-scale features) from a plurality of layers of deposited materials using adhered masks (e.g. formed from liquid photoresist or dry film), where two or more materials may be provided per layer where at least one of the materials is a structural material and one or more of any other materials may be a sacrificial material which will be removed after formation of the structure. Materials may comprise conductive materials that are electrodeposited or deposited in an electroless manner. In some embodiments special care is undertaken to ensure alignment between patterns formed on successive layers.
5 Citations
13 Claims
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1. A method for forming an alignment target on a substrate, comprising:
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forming a first patternable mold material on the substrate; patterning the first patternable mold material to form a first aperture; forming a first material in the first aperture to form an alignment target within the first aperture; removing the first patternable mold material; forming a second patternable mold material on the substrate so as to cover the alignment target; and forming the second patternable mold material to form a second aperture wider than and fully enclosing the alignment target. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method for electroplating a layer of material on a substrate, comprising:
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forming a conductive layer over a non-conductive surface of the substrate; forming a target in the conductive layer such that the target is electrically isolated from the remainder of the conductive layer by the non-conductive surface of the substrate; and electroplating the layer of material over the conductive layer such that the conductive layer is plated and the target is un-plated.
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12. A method for patterning odd and even layers of patternable material formed sequentially on a substrate, comprising:
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patterning the odd layers using first photomasks having a first layout of alignment shapes and new target shapes, the first layout having a first orientation relative to the substrate; and patterning the even layers using second photomasks having a second layout of alignment shapes and new target shapes, the second layout having a second orientation relative to the substrate different from the first orientation. - View Dependent Claims (13)
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Specification