IN-SITU MASK ALIGNMENT FOR DEPOSITION TOOLS

  • US 20120237682A1
  • Filed: 03/07/2012
  • Published: 09/20/2012
  • Est. Priority Date: 03/18/2011
  • Status: Abandoned Application
First Claim
Patent Images

1. A system for handling masked substrates, comprising:

  • a chamber having a pedestal for supporting a substrate, and a chuck for supporting a mask in relation to a substrate; and

    an alignment system operable to confirm alignment of the mask and the substrate.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×