MIRROR ARRANGEMENT, IN PARTICULAR FOR USE IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
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Accused Products
Abstract
The invention relates to a mirror arrangement, in particular for use in a microlithographic projection exposure apparatus, comprising a plurality of individual mirrors and a plurality of flexures, wherein each individual mirror is tiltable about at least one tilting axis via one of the flexures and wherein the flexures are integrated into a common component.
11 Citations
36 Claims
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1-16. -16. (canceled)
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17. A mirror arrangement, comprising:
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a component; a plurality of mirrors, each mirror being releasably connected to the component; and a plurality of flexures integrated into the component, wherein each flexure has a corresponding mirror, and each flexure is configured to tilt a corresponding mirror about a tilting axis. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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36. A method of using a microlithographic projection exposure apparatus which comprises an illumination device and a projection lens, the illumination device comprising a mirror arrangement which comprises a plurality of individual mirrors, a component and a plurality of flexures integrated into the component, the method comprising:
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using the illumination device to illuminate an object in an object field during which at least one of the mirrors is tilted about a tilting axis via its corresponding flexure component; and using the projection lens to project an image of the object into an image field.
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Specification