Structure having reduced lateral spacer erosion

  • US 6,784,552 B2
  • Filed: 03/31/2000
  • Issued: 08/31/2004
  • Est. Priority Date: 12/22/1995
  • Status: Expired due to Term
First Claim
Patent Images

1. A structure, comprising:

  • (a) a conductive layer disposed over a substrate;

    (b) a first insulating layer on the conductive layer;

    (c) a contact region in said first insulating layer;

    (d) at least one insulating spacer in the contact region adjacent to the first insulating layer; and

    (e) an etch stop material over said first insulating layer and adjacent to the insulating spacer, the etch stop material being a different material from the insulating spacer, wherein a side of the insulating spacer has an angle relative to the substrate surface that is either a right angle or an acute angle of more than 85°


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