Multilayer coatings for EUV mask substrates

  • US 7,326,502 B2
  • Filed: 09/18/2003
  • Issued: 02/05/2008
  • Est. Priority Date: 09/18/2003
  • Status: Active Grant
First Claim
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1. An apparatus, the apparatus comprising:

  • a substrate;

    a first multilayer of films on top of the substrate to form a flat top surface by a first deposition process; and

    a second multilayer of films on top of and in contact with the first multilayer of films, the second multilayer of films effectuating a Bragg reflector to reflect extreme ultraviolet radiation, the second multilayer of films being deposited with a second deposition process different from the first deposition process, wherein the second deposition process comprises an atomic layer deposition process.

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